Quantum Cascade Lasers Grown by Metalorganic Chemical Vapor Deposition on Foreign Substrates with Large Surface Roughness
The surface morphology of a buffer template is an important factor in the heteroepitaxial integration of optoelectronic devices with a significant lattice mismatch. In this work, InP-based long-wave infrared (~8 µm) emitting quantum cascade lasers with active region designs lattice-matched to InP we...
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MDPI AG
2023-12-01
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| Series: | Photonics |
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| Online Access: | https://www.mdpi.com/2304-6732/10/12/1377 |
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| author | Shining Xu Shuqi Zhang Jeremy D. Kirch Cheng Liu Andree Wibowo Sudersena R. Tatavarti Dan Botez Luke J. Mawst |
| author_facet | Shining Xu Shuqi Zhang Jeremy D. Kirch Cheng Liu Andree Wibowo Sudersena R. Tatavarti Dan Botez Luke J. Mawst |
| author_sort | Shining Xu |
| collection | DOAJ |
| description | The surface morphology of a buffer template is an important factor in the heteroepitaxial integration of optoelectronic devices with a significant lattice mismatch. In this work, InP-based long-wave infrared (~8 µm) emitting quantum cascade lasers with active region designs lattice-matched to InP were grown on GaAs and Si substrates employing InAlGaAs step-graded metamorphic buffer layers, as a means to assess the impact of surface roughness on device performance. A room-temperature pulsed-operation lasing with a relatively good device performance was obtained on a Si template, even with a large RMS roughness of 17.1 nm over 100 µm<sup>2</sup>. Such results demonstrate that intersubband-operating devices are highly tolerant to large RMS surface roughness, even in the presence of a high residual dislocation density. |
| first_indexed | 2024-03-08T20:25:50Z |
| format | Article |
| id | doaj.art-31617ba2dd494a0cbd1486724ccddc3d |
| institution | Directory Open Access Journal |
| issn | 2304-6732 |
| language | English |
| last_indexed | 2024-03-08T20:25:50Z |
| publishDate | 2023-12-01 |
| publisher | MDPI AG |
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| series | Photonics |
| spelling | doaj.art-31617ba2dd494a0cbd1486724ccddc3d2023-12-22T14:33:00ZengMDPI AGPhotonics2304-67322023-12-011012137710.3390/photonics10121377Quantum Cascade Lasers Grown by Metalorganic Chemical Vapor Deposition on Foreign Substrates with Large Surface RoughnessShining Xu0Shuqi Zhang1Jeremy D. Kirch2Cheng Liu3Andree Wibowo4Sudersena R. Tatavarti5Dan Botez6Luke J. Mawst7Department of Electrical and Computer Engineering, University of Wisconsin, Madison, WI 53706, USADepartment of Electrical and Computer Engineering, University of Wisconsin, Madison, WI 53706, USADepartment of Electrical and Computer Engineering, University of Wisconsin, Madison, WI 53706, USADepartment of Electrical and Computer Engineering, University of Wisconsin, Madison, WI 53706, USAMicrolink Devices Inc., Niles, IL 60714, USAMicrolink Devices Inc., Niles, IL 60714, USADepartment of Electrical and Computer Engineering, University of Wisconsin, Madison, WI 53706, USADepartment of Electrical and Computer Engineering, University of Wisconsin, Madison, WI 53706, USAThe surface morphology of a buffer template is an important factor in the heteroepitaxial integration of optoelectronic devices with a significant lattice mismatch. In this work, InP-based long-wave infrared (~8 µm) emitting quantum cascade lasers with active region designs lattice-matched to InP were grown on GaAs and Si substrates employing InAlGaAs step-graded metamorphic buffer layers, as a means to assess the impact of surface roughness on device performance. A room-temperature pulsed-operation lasing with a relatively good device performance was obtained on a Si template, even with a large RMS roughness of 17.1 nm over 100 µm<sup>2</sup>. Such results demonstrate that intersubband-operating devices are highly tolerant to large RMS surface roughness, even in the presence of a high residual dislocation density.https://www.mdpi.com/2304-6732/10/12/1377quantum cascade lasermonolithic integrationforeign substrateMOCVDmismatched epitaxysurface roughness |
| spellingShingle | Shining Xu Shuqi Zhang Jeremy D. Kirch Cheng Liu Andree Wibowo Sudersena R. Tatavarti Dan Botez Luke J. Mawst Quantum Cascade Lasers Grown by Metalorganic Chemical Vapor Deposition on Foreign Substrates with Large Surface Roughness Photonics quantum cascade laser monolithic integration foreign substrate MOCVD mismatched epitaxy surface roughness |
| title | Quantum Cascade Lasers Grown by Metalorganic Chemical Vapor Deposition on Foreign Substrates with Large Surface Roughness |
| title_full | Quantum Cascade Lasers Grown by Metalorganic Chemical Vapor Deposition on Foreign Substrates with Large Surface Roughness |
| title_fullStr | Quantum Cascade Lasers Grown by Metalorganic Chemical Vapor Deposition on Foreign Substrates with Large Surface Roughness |
| title_full_unstemmed | Quantum Cascade Lasers Grown by Metalorganic Chemical Vapor Deposition on Foreign Substrates with Large Surface Roughness |
| title_short | Quantum Cascade Lasers Grown by Metalorganic Chemical Vapor Deposition on Foreign Substrates with Large Surface Roughness |
| title_sort | quantum cascade lasers grown by metalorganic chemical vapor deposition on foreign substrates with large surface roughness |
| topic | quantum cascade laser monolithic integration foreign substrate MOCVD mismatched epitaxy surface roughness |
| url | https://www.mdpi.com/2304-6732/10/12/1377 |
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