ZnO and ZnO-Based Materials as Active Layer in Resistive Random-Access Memory (RRAM)

In this paper, an overview of the influence of various modifications on ZnO-based RRAM has been conducted. Firstly, the motivation for creating new memory technology is presented. The resistive switching mechanism is explained, including its response to the selection of active layers and electrodes....

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Main Authors: Ewelina Nowak, Edyta Chłopocka, Mirosław Szybowicz
Format: Article
Language:English
Published: MDPI AG 2023-02-01
Series:Crystals
Subjects:
Online Access:https://www.mdpi.com/2073-4352/13/3/416
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author Ewelina Nowak
Edyta Chłopocka
Mirosław Szybowicz
author_facet Ewelina Nowak
Edyta Chłopocka
Mirosław Szybowicz
author_sort Ewelina Nowak
collection DOAJ
description In this paper, an overview of the influence of various modifications on ZnO-based RRAM has been conducted. Firstly, the motivation for creating new memory technology is presented. The resistive switching mechanism is explained, including its response to the selection of active layers and electrodes. A comparison of ZnO devices assembled via different deposition methods is made. Additional treatment of the active layer and electrodes improving the performance are reported. This work gives an overview of the influence of different dopants on the characteristics of the device. The manuscript overviews the previous investigation of inclusion of inserting layers and nanostructures into ZnO-based RRAM.
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spelling doaj.art-318ec752ee404f8fbea3a311f056a59c2023-11-17T10:28:28ZengMDPI AGCrystals2073-43522023-02-0113341610.3390/cryst13030416ZnO and ZnO-Based Materials as Active Layer in Resistive Random-Access Memory (RRAM)Ewelina Nowak0Edyta Chłopocka1Mirosław Szybowicz2Insitute of Materials Research and Quantum Engineering, Poznań University of Technology, 61-139 Poznań, PolandInsitute of Materials Research and Quantum Engineering, Poznań University of Technology, 61-139 Poznań, PolandInsitute of Materials Research and Quantum Engineering, Poznań University of Technology, 61-139 Poznań, PolandIn this paper, an overview of the influence of various modifications on ZnO-based RRAM has been conducted. Firstly, the motivation for creating new memory technology is presented. The resistive switching mechanism is explained, including its response to the selection of active layers and electrodes. A comparison of ZnO devices assembled via different deposition methods is made. Additional treatment of the active layer and electrodes improving the performance are reported. This work gives an overview of the influence of different dopants on the characteristics of the device. The manuscript overviews the previous investigation of inclusion of inserting layers and nanostructures into ZnO-based RRAM.https://www.mdpi.com/2073-4352/13/3/416ZnOMoS<sub>2</sub>graphenedopingmemristorresistive switching
spellingShingle Ewelina Nowak
Edyta Chłopocka
Mirosław Szybowicz
ZnO and ZnO-Based Materials as Active Layer in Resistive Random-Access Memory (RRAM)
Crystals
ZnO
MoS<sub>2</sub>
graphene
doping
memristor
resistive switching
title ZnO and ZnO-Based Materials as Active Layer in Resistive Random-Access Memory (RRAM)
title_full ZnO and ZnO-Based Materials as Active Layer in Resistive Random-Access Memory (RRAM)
title_fullStr ZnO and ZnO-Based Materials as Active Layer in Resistive Random-Access Memory (RRAM)
title_full_unstemmed ZnO and ZnO-Based Materials as Active Layer in Resistive Random-Access Memory (RRAM)
title_short ZnO and ZnO-Based Materials as Active Layer in Resistive Random-Access Memory (RRAM)
title_sort zno and zno based materials as active layer in resistive random access memory rram
topic ZnO
MoS<sub>2</sub>
graphene
doping
memristor
resistive switching
url https://www.mdpi.com/2073-4352/13/3/416
work_keys_str_mv AT ewelinanowak znoandznobasedmaterialsasactivelayerinresistiverandomaccessmemoryrram
AT edytachłopocka znoandznobasedmaterialsasactivelayerinresistiverandomaccessmemoryrram
AT mirosławszybowicz znoandznobasedmaterialsasactivelayerinresistiverandomaccessmemoryrram