Controlling the Nanoscale Patterning of AuNPs on Silicon Surfaces

This study evaluates the effectiveness of vapour-phase deposition for creating sub-monolayer coverage of aminopropyl triethoxysilane (APTES) on silicon in order to exert control over subsequent gold nanoparticle deposition. Surface coverage was evaluated indirectly by observing the extent to which g...

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Main Authors: Chris J. Allender, Jenna L. Bowen, Sophie E. Williams, Philip R. Davies
Format: Article
Language:English
Published: MDPI AG 2013-03-01
Series:Nanomaterials
Subjects:
Online Access:http://www.mdpi.com/2079-4991/3/1/192
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author Chris J. Allender
Jenna L. Bowen
Sophie E. Williams
Philip R. Davies
author_facet Chris J. Allender
Jenna L. Bowen
Sophie E. Williams
Philip R. Davies
author_sort Chris J. Allender
collection DOAJ
description This study evaluates the effectiveness of vapour-phase deposition for creating sub-monolayer coverage of aminopropyl triethoxysilane (APTES) on silicon in order to exert control over subsequent gold nanoparticle deposition. Surface coverage was evaluated indirectly by observing the extent to which gold nanoparticles (AuNPs) deposited onto the modified silicon surface. By varying the distance of the silicon wafer from the APTES source and concentration of APTES in the evaporating media, control over subsequent gold nanoparticle deposition was achievable to an extent. Fine control over AuNP deposition (AuNPs/μm2) however, was best achieved by adjusting the ionic concentration of the AuNP-depositing solution. Furthermore it was demonstrated that although APTES was fully removed from the silicon surface following four hours incubation in water, the gold nanoparticle-amino surface complex was stable under the same conditions. Atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) were used to study these affects.
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spelling doaj.art-320020bf86e94fb2854b9e9503ac6b242022-12-21T19:33:33ZengMDPI AGNanomaterials2079-49912013-03-013119220310.3390/nano3010192Controlling the Nanoscale Patterning of AuNPs on Silicon SurfacesChris J. AllenderJenna L. BowenSophie E. WilliamsPhilip R. DaviesThis study evaluates the effectiveness of vapour-phase deposition for creating sub-monolayer coverage of aminopropyl triethoxysilane (APTES) on silicon in order to exert control over subsequent gold nanoparticle deposition. Surface coverage was evaluated indirectly by observing the extent to which gold nanoparticles (AuNPs) deposited onto the modified silicon surface. By varying the distance of the silicon wafer from the APTES source and concentration of APTES in the evaporating media, control over subsequent gold nanoparticle deposition was achievable to an extent. Fine control over AuNP deposition (AuNPs/μm2) however, was best achieved by adjusting the ionic concentration of the AuNP-depositing solution. Furthermore it was demonstrated that although APTES was fully removed from the silicon surface following four hours incubation in water, the gold nanoparticle-amino surface complex was stable under the same conditions. Atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) were used to study these affects.http://www.mdpi.com/2079-4991/3/1/192vapour-phase depositionAPTESgoldnanoparticlechemical nanopatterning
spellingShingle Chris J. Allender
Jenna L. Bowen
Sophie E. Williams
Philip R. Davies
Controlling the Nanoscale Patterning of AuNPs on Silicon Surfaces
Nanomaterials
vapour-phase deposition
APTES
gold
nanoparticle
chemical nanopatterning
title Controlling the Nanoscale Patterning of AuNPs on Silicon Surfaces
title_full Controlling the Nanoscale Patterning of AuNPs on Silicon Surfaces
title_fullStr Controlling the Nanoscale Patterning of AuNPs on Silicon Surfaces
title_full_unstemmed Controlling the Nanoscale Patterning of AuNPs on Silicon Surfaces
title_short Controlling the Nanoscale Patterning of AuNPs on Silicon Surfaces
title_sort controlling the nanoscale patterning of aunps on silicon surfaces
topic vapour-phase deposition
APTES
gold
nanoparticle
chemical nanopatterning
url http://www.mdpi.com/2079-4991/3/1/192
work_keys_str_mv AT chrisjallender controllingthenanoscalepatterningofaunpsonsiliconsurfaces
AT jennalbowen controllingthenanoscalepatterningofaunpsonsiliconsurfaces
AT sophieewilliams controllingthenanoscalepatterningofaunpsonsiliconsurfaces
AT philiprdavies controllingthenanoscalepatterningofaunpsonsiliconsurfaces