Dielectric Characterization of SiO2-PMMA Organic – Inorganic Hybrid Thin Films

For the research presented in this paper, hybrid organic-inorganic materials were prepared using a modified sol-gel reaction. Hybrid organic-inorganic compounds were synthesized in ethanol using methylmethacrylate (MMA), SiO2 nanoparticles, and 3-trimetoxi-silil-propilmethacrylate (TMSPM) as couplin...

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Bibliographic Details
Main Author: Elena Emanuela HERBEI
Format: Article
Language:English
Published: Galati University Press 2019-12-01
Series:The Annals of “Dunarea de Jos” University of Galati. Fascicle IX, Metallurgy and Materials Science
Subjects:
Online Access:https://www.gup.ugal.ro/ugaljournals/index.php/mms/article/view/2817
Description
Summary:For the research presented in this paper, hybrid organic-inorganic materials were prepared using a modified sol-gel reaction. Hybrid organic-inorganic compounds were synthesized in ethanol using methylmethacrylate (MMA), SiO2 nanoparticles, and 3-trimetoxi-silil-propilmethacrylate (TMSPM) as coupling agent. For the deposition of thin films, the spincoating method was used. The electrical measurements of dielectric thin films were done using a metalinsulator-metal (MIM) devices fabricated to study the dielectric constant of the films as function of frequency (measured at 1 MHz). Electrical results show a weak trend of the dielectric constant of the hybrid films with different MMA molar ratio. More importantly, the PMMA-SiO2 hybrid films showed a higher dielectric constant than SiO2 and PMMA layers, due to the presence of additional C-O-C bond. For the calculation of dielectric permittivity, the thickness of thin films was measured using cross-section SEM micrographs and the value of dielectric permittivity was calculated using electrical capacitance formula.
ISSN:2668-4748
2668-4756