Development of an APPLE III undulator prototype with three-dimensional force compensation for SHINE
The Shanghai high-repetition-rate XFEL and extreme light facility (SHINE) plans to install several elliptically polarizing undulators (EPUs) as afterburners behind the planar undulator section to obtain nearly saturated circularly polarized free-electron laser (FEL) radiation. Therefore, the SHINE R...
Main Authors: | , , , , , , , , , , , , , , , |
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Format: | Article |
Language: | English |
Published: |
Frontiers Media S.A.
2023-06-01
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Series: | Frontiers in Physics |
Subjects: | |
Online Access: | https://www.frontiersin.org/articles/10.3389/fphy.2023.1174620/full |