Development of an APPLE III undulator prototype with three-dimensional force compensation for SHINE

The Shanghai high-repetition-rate XFEL and extreme light facility (SHINE) plans to install several elliptically polarizing undulators (EPUs) as afterburners behind the planar undulator section to obtain nearly saturated circularly polarized free-electron laser (FEL) radiation. Therefore, the SHINE R...

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Bibliographic Details
Main Authors: Cheng Yu, Ya Zhu, Wei Zhang, Jie Yang, Yongzhou He, Tingting Zhen, Tao Liu, Yangyang Lei, Qibing Yuan, Dao Yuan, Yongmei Wen, Rongbing Deng, Zhiqiang Jiang, Haixiao Deng, Bo Liu, Dong Wang
Format: Article
Language:English
Published: Frontiers Media S.A. 2023-06-01
Series:Frontiers in Physics
Subjects:
Online Access:https://www.frontiersin.org/articles/10.3389/fphy.2023.1174620/full