Fabrication of p-type TiO2 and transparent p-TiO2/n-ITO p-n junctions

Fabrication of p-type TiO2 and transparent p-TiO2/n-ITO p-n junctions

This study reports a transparent p-type TiO2 thin film by DC reactive magnetron sputtering method with 10% O2 partial pressure. The p-type conduction of TiO2 thin film was also confirmed by Seebeck effect. The lowest resistivity (1.458×10-2 Ω·cm) of the studied TiO2 thin film occurs at the annealing...

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Bibliographic Details
Main Authors: Chia-Hua Lin, Ching-Han Liao, Wei-Hao Chen, Chia-Yuen Chou, Cheng-Yi Liu
Format: Article
Language:English
Published: AIP Publishing LLC 2019-04-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.5092782

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