Graphene Growth on Electroformed Copper Substrates by Atmospheric Pressure CVD
Chemical vapor deposition (CVD) is regarded as the most promising technique for the mass production of graphene. CVD synthesis under vacuum is the most employed process, because the slower kinetics give better control on the graphene quality, but the requirement for high-vacuum equipment heavily aff...
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| Format: | Article |
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MDPI AG
2022-02-01
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| Series: | Materials |
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| Online Access: | https://www.mdpi.com/1996-1944/15/4/1572 |
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| author | Lorenzo Pedrazzetti Eugenio Gibertini Fabio Bizzoni Valeria Russo Andrea Lucotti Luca Nobili Luca Magagnin |
| author_facet | Lorenzo Pedrazzetti Eugenio Gibertini Fabio Bizzoni Valeria Russo Andrea Lucotti Luca Nobili Luca Magagnin |
| author_sort | Lorenzo Pedrazzetti |
| collection | DOAJ |
| description | Chemical vapor deposition (CVD) is regarded as the most promising technique for the mass production of graphene. CVD synthesis under vacuum is the most employed process, because the slower kinetics give better control on the graphene quality, but the requirement for high-vacuum equipment heavily affects the overall energy cost. In this work, we explore the possibility of using electroformed Cu substrate as a catalyst for atmospheric-pressure graphene growth. Electrochemical processes can produce high purity, freestanding metallic films, avoiding the surface defects that characterize the rolled foils. It was found that the growth mode of graphene on the electroformed catalyst was related to the surface morphology, which, in turn, was affected by the preliminary treatment of the substrate material. Suitable conditions for growing single layer graphene were identified. |
| first_indexed | 2024-03-09T21:31:14Z |
| format | Article |
| id | doaj.art-3522ccf5bdfe40cfbe084d7351194d5a |
| institution | Directory Open Access Journal |
| issn | 1996-1944 |
| language | English |
| last_indexed | 2024-03-09T21:31:14Z |
| publishDate | 2022-02-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Materials |
| spelling | doaj.art-3522ccf5bdfe40cfbe084d7351194d5a2023-11-23T20:55:23ZengMDPI AGMaterials1996-19442022-02-01154157210.3390/ma15041572Graphene Growth on Electroformed Copper Substrates by Atmospheric Pressure CVDLorenzo Pedrazzetti0Eugenio Gibertini1Fabio Bizzoni2Valeria Russo3Andrea Lucotti4Luca Nobili5Luca Magagnin6Department of Chemistry, Materials and Chemical Engineering “Giulio Natta”, Politecnico di Milano, 20131 Milano, ItalyDepartment of Chemistry, Materials and Chemical Engineering “Giulio Natta”, Politecnico di Milano, 20131 Milano, ItalyDepartment of Chemistry, Materials and Chemical Engineering “Giulio Natta”, Politecnico di Milano, 20131 Milano, ItalyEnergy Department, Politecnico di Milano, 20133 Milano, ItalyDepartment of Chemistry, Materials and Chemical Engineering “Giulio Natta”, Politecnico di Milano, 20131 Milano, ItalyDepartment of Chemistry, Materials and Chemical Engineering “Giulio Natta”, Politecnico di Milano, 20131 Milano, ItalyDepartment of Chemistry, Materials and Chemical Engineering “Giulio Natta”, Politecnico di Milano, 20131 Milano, ItalyChemical vapor deposition (CVD) is regarded as the most promising technique for the mass production of graphene. CVD synthesis under vacuum is the most employed process, because the slower kinetics give better control on the graphene quality, but the requirement for high-vacuum equipment heavily affects the overall energy cost. In this work, we explore the possibility of using electroformed Cu substrate as a catalyst for atmospheric-pressure graphene growth. Electrochemical processes can produce high purity, freestanding metallic films, avoiding the surface defects that characterize the rolled foils. It was found that the growth mode of graphene on the electroformed catalyst was related to the surface morphology, which, in turn, was affected by the preliminary treatment of the substrate material. Suitable conditions for growing single layer graphene were identified.https://www.mdpi.com/1996-1944/15/4/1572grapheneCVDelectroforming |
| spellingShingle | Lorenzo Pedrazzetti Eugenio Gibertini Fabio Bizzoni Valeria Russo Andrea Lucotti Luca Nobili Luca Magagnin Graphene Growth on Electroformed Copper Substrates by Atmospheric Pressure CVD Materials graphene CVD electroforming |
| title | Graphene Growth on Electroformed Copper Substrates by Atmospheric Pressure CVD |
| title_full | Graphene Growth on Electroformed Copper Substrates by Atmospheric Pressure CVD |
| title_fullStr | Graphene Growth on Electroformed Copper Substrates by Atmospheric Pressure CVD |
| title_full_unstemmed | Graphene Growth on Electroformed Copper Substrates by Atmospheric Pressure CVD |
| title_short | Graphene Growth on Electroformed Copper Substrates by Atmospheric Pressure CVD |
| title_sort | graphene growth on electroformed copper substrates by atmospheric pressure cvd |
| topic | graphene CVD electroforming |
| url | https://www.mdpi.com/1996-1944/15/4/1572 |
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