Achieving pattern uniformity in plasmonic lithography by spatial frequency selection
The effects of the surface roughness of thin films and defects on photomasks are investigated in two representative plasmonic lithography systems: thin silver film-based superlens and multilayer-based hyperbolic metamaterial (HMM). Superlens can replicate arbitrary patterns because of its broad evan...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
De Gruyter
2018-01-01
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| Series: | Nanophotonics |
| Subjects: | |
| Online Access: | https://doi.org/10.1515/nanoph-2017-0028 |
| _version_ | 1818727997239197696 |
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| author | Liang Gaofeng Chen Xi Zhao Qing Guo L. Jay |
| author_facet | Liang Gaofeng Chen Xi Zhao Qing Guo L. Jay |
| author_sort | Liang Gaofeng |
| collection | DOAJ |
| description | The effects of the surface roughness of thin films and defects on photomasks are investigated in two representative plasmonic lithography systems: thin silver film-based superlens and multilayer-based hyperbolic metamaterial (HMM). Superlens can replicate arbitrary patterns because of its broad evanescent wave passband, which also makes it inherently vulnerable to the roughness of the thin film and imperfections of the mask. On the other hand, the HMM system has spatial frequency filtering characteristics and its pattern formation is based on interference, producing uniform and stable periodic patterns. In this work, we show that the HMM system is more immune to such imperfections due to its function of spatial frequency selection. The analyses are further verified by an interference lithography system incorporating the photoresist layer as an optical waveguide to improve the aspect ratio of the pattern. It is concluded that a system capable of spatial frequency selection is a powerful method to produce deep-subwavelength periodic patterns with high degree of uniformity and fidelity. |
| first_indexed | 2024-12-17T22:22:59Z |
| format | Article |
| id | doaj.art-3525b30b9d1c4c7d88c16ad90ea2c2f8 |
| institution | Directory Open Access Journal |
| issn | 2192-8606 2192-8614 |
| language | English |
| last_indexed | 2024-12-17T22:22:59Z |
| publishDate | 2018-01-01 |
| publisher | De Gruyter |
| record_format | Article |
| series | Nanophotonics |
| spelling | doaj.art-3525b30b9d1c4c7d88c16ad90ea2c2f82022-12-21T21:30:25ZengDe GruyterNanophotonics2192-86062192-86142018-01-017127728610.1515/nanoph-2017-0028nanoph-2017-0028Achieving pattern uniformity in plasmonic lithography by spatial frequency selectionLiang Gaofeng0Chen Xi1Zhao Qing2Guo L. Jay3Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, MI 48109, USADepartment of Electrical Engineering and Computer Science and Applied Physics, University of Michigan, Ann Arbor, MI 48109, USASchool of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054, ChinaDepartment of Electrical Engineering and Computer Science and Applied Physics, University of Michigan, Ann Arbor, MI 48109, USAThe effects of the surface roughness of thin films and defects on photomasks are investigated in two representative plasmonic lithography systems: thin silver film-based superlens and multilayer-based hyperbolic metamaterial (HMM). Superlens can replicate arbitrary patterns because of its broad evanescent wave passband, which also makes it inherently vulnerable to the roughness of the thin film and imperfections of the mask. On the other hand, the HMM system has spatial frequency filtering characteristics and its pattern formation is based on interference, producing uniform and stable periodic patterns. In this work, we show that the HMM system is more immune to such imperfections due to its function of spatial frequency selection. The analyses are further verified by an interference lithography system incorporating the photoresist layer as an optical waveguide to improve the aspect ratio of the pattern. It is concluded that a system capable of spatial frequency selection is a powerful method to produce deep-subwavelength periodic patterns with high degree of uniformity and fidelity.https://doi.org/10.1515/nanoph-2017-0028surface plasmonplasmonic lithographyroughness |
| spellingShingle | Liang Gaofeng Chen Xi Zhao Qing Guo L. Jay Achieving pattern uniformity in plasmonic lithography by spatial frequency selection Nanophotonics surface plasmon plasmonic lithography roughness |
| title | Achieving pattern uniformity in plasmonic lithography by spatial frequency selection |
| title_full | Achieving pattern uniformity in plasmonic lithography by spatial frequency selection |
| title_fullStr | Achieving pattern uniformity in plasmonic lithography by spatial frequency selection |
| title_full_unstemmed | Achieving pattern uniformity in plasmonic lithography by spatial frequency selection |
| title_short | Achieving pattern uniformity in plasmonic lithography by spatial frequency selection |
| title_sort | achieving pattern uniformity in plasmonic lithography by spatial frequency selection |
| topic | surface plasmon plasmonic lithography roughness |
| url | https://doi.org/10.1515/nanoph-2017-0028 |
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