Achieving pattern uniformity in plasmonic lithography by spatial frequency selection

Achieving pattern uniformity in plasmonic lithography by spatial frequency selection

The effects of the surface roughness of thin films and defects on photomasks are investigated in two representative plasmonic lithography systems: thin silver film-based superlens and multilayer-based hyperbolic metamaterial (HMM). Superlens can replicate arbitrary patterns because of its broad evan...

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Bibliographic Details
Main Authors: Liang Gaofeng, Chen Xi, Zhao Qing, Guo L. Jay
Format: Article
Language:English
Published: De Gruyter 2018-01-01
Series:Nanophotonics
Subjects:
surface plasmon
plasmonic lithography
roughness
Online Access:https://doi.org/10.1515/nanoph-2017-0028

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