Structural and electronic properties of the transition layer at the SiO2/4H-SiC interface
Using first-principles methods, we generate an amorphous SiO2/4H-SiC interface with a transition layer. Based this interface model, we investigate the structural and electronic properties of the interfacial transition layer. The calculated Si 2p core-level shifts for this interface are comparable to...
Main Authors: | Wenbo Li, Jijun Zhao, Dejun Wang |
---|---|
Format: | Article |
Language: | English |
Published: |
AIP Publishing LLC
2015-01-01
|
Series: | AIP Advances |
Online Access: | http://dx.doi.org/10.1063/1.4906257 |
Similar Items
-
Abrupt model interface for the 4H(1000)SiC-SiO2 interface
by: Devynck, F, et al.
Published: (2005) -
Atomistic model of the 4H(0001)SiC-SiO2 interface: structural and electronic properties
by: Devynck, F, et al.
Published: (2007) -
Atomistic model of the 4H(0001)SiC-SiO2 interface: Structural and electronic properties
by: Devynck, F, et al.
Published: (2007) -
Characterization of SiO<sub>2</sub>/4H-SiC Interfaces in 4H-SiC MOSFETs: A Review
by: Patrick Fiorenza, et al.
Published: (2019-06-01) -
4H-SiC/SiO<sub>2</sub> Interface Degradation in 1.2 kV 4H-SiC MOSFETs Due to Power Cycling Tests
by: Dahui Yoo, et al.
Published: (2024-03-01)