Abatement of Nitrophenol in Aqueous Solution by HOCl and UV/HOCl Processes: Kinetics, Mechanisms, and Formation of Chlorinated Nitrogenous Byproducts

HOCl and UV activated HOCl (UV/HOCl) have been applied for water disinfection and abatement of organic contaminants. However, the production of toxic byproducts in the HOCl and UV/HOCl treatment should be scrutinized. This contribution comparatively investigated the elimination of 4-nitrophenol and...

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Main Authors: Xiaoci Li, Yan Cai, Junhe Lu, Jean-Marc Chovelon, Jing Chen, Canlan Jiang, Yuefei Ji
Format: Article
Language:English
Published: MDPI AG 2023-11-01
Series:Water
Subjects:
Online Access:https://www.mdpi.com/2073-4441/15/23/4038
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author Xiaoci Li
Yan Cai
Junhe Lu
Jean-Marc Chovelon
Jing Chen
Canlan Jiang
Yuefei Ji
author_facet Xiaoci Li
Yan Cai
Junhe Lu
Jean-Marc Chovelon
Jing Chen
Canlan Jiang
Yuefei Ji
author_sort Xiaoci Li
collection DOAJ
description HOCl and UV activated HOCl (UV/HOCl) have been applied for water disinfection and abatement of organic contaminants. However, the production of toxic byproducts in the HOCl and UV/HOCl treatment should be scrutinized. This contribution comparatively investigated the elimination of 4-nitrophenol and the generation of chlorinated byproducts in HOCl and UV/HOCl treatment processes. 61.4% of 4-nitrophenol was removed by UV/HOCl in 5 min with HOCl dose of 60 μM, significantly higher than that by UV (3.3%) or HOCl alone (32.0%). Radical quenching test showed that HO<sup>•</sup> and Cl<sup>•</sup> played important roles in UV/HOCl process. 2-Chloro-4-nitrophenol and 2,6-dichloro-4-nitrophenol were generated consecutively in HOCl process; but their formation was less in the UV/HOCl process. Trichloronitromethane (TCNM) was only found in the UV/HOCl process, and its production increased with increasing HOCl dosage. Besides chlorinated products hydroxylated and dinitrated products were also identified in the UV/HOCl process. Transformation pathways involving electrophilic substitution, hydroxylation, and nitration were proposed for 4-nitrophenol transformation in the UV/HOCl process. Wastewater matrix could significantly promote the transformation of 4-nitrophenol to 2-chloro-4-nitrophenol in UV/HOCl process. Results of this study are helpful to advance the understanding of the transformation of nitrophenolic compounds and assess the formation potential of chlorinated byproducts in HOCl and UV/HOCl disinfection processes.
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spelling doaj.art-36b0483069184ecdacca2fde37411a0a2023-12-08T15:28:11ZengMDPI AGWater2073-44412023-11-011523403810.3390/w15234038Abatement of Nitrophenol in Aqueous Solution by HOCl and UV/HOCl Processes: Kinetics, Mechanisms, and Formation of Chlorinated Nitrogenous ByproductsXiaoci Li0Yan Cai1Junhe Lu2Jean-Marc Chovelon3Jing Chen4Canlan Jiang5Yuefei Ji6College of Resources and Environmental Sciences, Nanjing Agricultural University, Nanjing 210095, ChinaCollege of Resources and Environmental Sciences, Nanjing Agricultural University, Nanjing 210095, ChinaCollege of Resources and Environmental Sciences, Nanjing Agricultural University, Nanjing 210095, ChinaUniv Lyon, Université Claude Bernard Lyon 1, CNRS, IRCELYON, F-69626 Villeurbanne, FranceCollege of Resources and Environmental Sciences, Nanjing Agricultural University, Nanjing 210095, ChinaCollege of Resources and Environmental Sciences, Nanjing Agricultural University, Nanjing 210095, ChinaCollege of Resources and Environmental Sciences, Nanjing Agricultural University, Nanjing 210095, ChinaHOCl and UV activated HOCl (UV/HOCl) have been applied for water disinfection and abatement of organic contaminants. However, the production of toxic byproducts in the HOCl and UV/HOCl treatment should be scrutinized. This contribution comparatively investigated the elimination of 4-nitrophenol and the generation of chlorinated byproducts in HOCl and UV/HOCl treatment processes. 61.4% of 4-nitrophenol was removed by UV/HOCl in 5 min with HOCl dose of 60 μM, significantly higher than that by UV (3.3%) or HOCl alone (32.0%). Radical quenching test showed that HO<sup>•</sup> and Cl<sup>•</sup> played important roles in UV/HOCl process. 2-Chloro-4-nitrophenol and 2,6-dichloro-4-nitrophenol were generated consecutively in HOCl process; but their formation was less in the UV/HOCl process. Trichloronitromethane (TCNM) was only found in the UV/HOCl process, and its production increased with increasing HOCl dosage. Besides chlorinated products hydroxylated and dinitrated products were also identified in the UV/HOCl process. Transformation pathways involving electrophilic substitution, hydroxylation, and nitration were proposed for 4-nitrophenol transformation in the UV/HOCl process. Wastewater matrix could significantly promote the transformation of 4-nitrophenol to 2-chloro-4-nitrophenol in UV/HOCl process. Results of this study are helpful to advance the understanding of the transformation of nitrophenolic compounds and assess the formation potential of chlorinated byproducts in HOCl and UV/HOCl disinfection processes.https://www.mdpi.com/2073-4441/15/23/4038UV/HOClreactive chlorine speciesnitrogenous disinfection byproductsnitrogen dioxide radicaltrichloronitromethane
spellingShingle Xiaoci Li
Yan Cai
Junhe Lu
Jean-Marc Chovelon
Jing Chen
Canlan Jiang
Yuefei Ji
Abatement of Nitrophenol in Aqueous Solution by HOCl and UV/HOCl Processes: Kinetics, Mechanisms, and Formation of Chlorinated Nitrogenous Byproducts
Water
UV/HOCl
reactive chlorine species
nitrogenous disinfection byproducts
nitrogen dioxide radical
trichloronitromethane
title Abatement of Nitrophenol in Aqueous Solution by HOCl and UV/HOCl Processes: Kinetics, Mechanisms, and Formation of Chlorinated Nitrogenous Byproducts
title_full Abatement of Nitrophenol in Aqueous Solution by HOCl and UV/HOCl Processes: Kinetics, Mechanisms, and Formation of Chlorinated Nitrogenous Byproducts
title_fullStr Abatement of Nitrophenol in Aqueous Solution by HOCl and UV/HOCl Processes: Kinetics, Mechanisms, and Formation of Chlorinated Nitrogenous Byproducts
title_full_unstemmed Abatement of Nitrophenol in Aqueous Solution by HOCl and UV/HOCl Processes: Kinetics, Mechanisms, and Formation of Chlorinated Nitrogenous Byproducts
title_short Abatement of Nitrophenol in Aqueous Solution by HOCl and UV/HOCl Processes: Kinetics, Mechanisms, and Formation of Chlorinated Nitrogenous Byproducts
title_sort abatement of nitrophenol in aqueous solution by hocl and uv hocl processes kinetics mechanisms and formation of chlorinated nitrogenous byproducts
topic UV/HOCl
reactive chlorine species
nitrogenous disinfection byproducts
nitrogen dioxide radical
trichloronitromethane
url https://www.mdpi.com/2073-4441/15/23/4038
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