Alumina deposited by metal-organic chemical vapour deposition process on NiCoCrAlYTa superalloy

Alumina deposit was produced by metalorganic chemical vapour deposition process on a NiCoCrAlY superalloy substrate. Low frequency injection in the range 5–10 Hz was used to feed the Aluminium Tri-isopropoxide precursor into a deposit chamber holding at 400 °C of temperature. Both scanning electron...

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Main Authors: Melquisedec Vicente Mendoza, Edgar Serrano Peréz, Fernando Juárez López
Format: Article
Language:English
Published: Elsevier 2022-09-01
Series:Materials Letters: X
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S2590150822000400
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author Melquisedec Vicente Mendoza
Edgar Serrano Peréz
Fernando Juárez López
author_facet Melquisedec Vicente Mendoza
Edgar Serrano Peréz
Fernando Juárez López
author_sort Melquisedec Vicente Mendoza
collection DOAJ
description Alumina deposit was produced by metalorganic chemical vapour deposition process on a NiCoCrAlY superalloy substrate. Low frequency injection in the range 5–10 Hz was used to feed the Aluminium Tri-isopropoxide precursor into a deposit chamber holding at 400 °C of temperature. Both scanning electron microscopy and X-ray diffraction analysis were accomplished to characterize the deposited alumina. Topographic images show an alumina deposit roughness of Ra 35 nm measured by atomic force microscopy. An X-photon spectroscopy analysis of the alumina deposit was performed to identify both Al species and chemical analysis. Thermo-gravimetric analysis was conducted to assess the effect of deposited alumina on the superalloy.
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spelling doaj.art-36bbf614063b40fabf46c9ebd33fd19b2022-12-22T03:12:04ZengElsevierMaterials Letters: X2590-15082022-09-0115100160Alumina deposited by metal-organic chemical vapour deposition process on NiCoCrAlYTa superalloyMelquisedec Vicente Mendoza0Edgar Serrano Peréz1Fernando Juárez López2Instituto Politécnico Nacional, CIITEC, Cerrada de Cecati, Sta, Catarina, D.F. 02250 México, MexicoUNITEC Estado de México, Campus Atizapan, 52970 México, MexicoInstituto Politécnico Nacional, CIITEC, Cerrada de Cecati, Sta, Catarina, D.F. 02250 México, Mexico; Corresponding author.Alumina deposit was produced by metalorganic chemical vapour deposition process on a NiCoCrAlY superalloy substrate. Low frequency injection in the range 5–10 Hz was used to feed the Aluminium Tri-isopropoxide precursor into a deposit chamber holding at 400 °C of temperature. Both scanning electron microscopy and X-ray diffraction analysis were accomplished to characterize the deposited alumina. Topographic images show an alumina deposit roughness of Ra 35 nm measured by atomic force microscopy. An X-photon spectroscopy analysis of the alumina deposit was performed to identify both Al species and chemical analysis. Thermo-gravimetric analysis was conducted to assess the effect of deposited alumina on the superalloy.http://www.sciencedirect.com/science/article/pii/S2590150822000400MOCVDAluminaMCrAlY superalloy
spellingShingle Melquisedec Vicente Mendoza
Edgar Serrano Peréz
Fernando Juárez López
Alumina deposited by metal-organic chemical vapour deposition process on NiCoCrAlYTa superalloy
Materials Letters: X
MOCVD
Alumina
MCrAlY superalloy
title Alumina deposited by metal-organic chemical vapour deposition process on NiCoCrAlYTa superalloy
title_full Alumina deposited by metal-organic chemical vapour deposition process on NiCoCrAlYTa superalloy
title_fullStr Alumina deposited by metal-organic chemical vapour deposition process on NiCoCrAlYTa superalloy
title_full_unstemmed Alumina deposited by metal-organic chemical vapour deposition process on NiCoCrAlYTa superalloy
title_short Alumina deposited by metal-organic chemical vapour deposition process on NiCoCrAlYTa superalloy
title_sort alumina deposited by metal organic chemical vapour deposition process on nicocralyta superalloy
topic MOCVD
Alumina
MCrAlY superalloy
url http://www.sciencedirect.com/science/article/pii/S2590150822000400
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