The use of atomic force microscopy to assess the quality of cleaning and tribometric properties of a silicon wafer surface

Differences in the values of adhesive forces of interaction between the probe tip of an atomic force microscope and the cleaned surfaces of silicon wafers during their treatment with isopropyl alcohol and distilled water were investigated experimentally. It was shown that the presence of water molec...

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Main Authors: Igor Mikheev, Faat Vakhitov
Format: Article
Language:English
Published: Samara National Research University 2019-06-01
Series:Компьютерная оптика
Subjects:
Online Access:http://computeroptics.smr.ru/KO/PDF/KO43-3/430320.pdf
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author Igor Mikheev
Faat Vakhitov
author_facet Igor Mikheev
Faat Vakhitov
author_sort Igor Mikheev
collection DOAJ
description Differences in the values of adhesive forces of interaction between the probe tip of an atomic force microscope and the cleaned surfaces of silicon wafers during their treatment with isopropyl alcohol and distilled water were investigated experimentally. It was shown that the presence of water molecules on the surface of the substrates leads to a significant (approximately 5 times) change in the value of these forces. It was found that the use of AFM allows the relative magnitude of friction forces in small areas of silicon wafer surfaces to be estimated.
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spelling doaj.art-38412b6baf2f4fb3a130554b91bc8e902022-12-21T19:40:34ZengSamara National Research UniversityКомпьютерная оптика0134-24522412-61792019-06-0143350751110.18287/2412-6179-2019-43-3-507-511The use of atomic force microscopy to assess the quality of cleaning and tribometric properties of a silicon wafer surfaceIgor Mikheev 0Faat Vakhitov1Kazan National Research Technical University n.a. A.N. Tupolev – KAI, Kazan, RussiaKazan National Research Technical University n.a. A.N. Tupolev – KAI, Kazan, RussiaDifferences in the values of adhesive forces of interaction between the probe tip of an atomic force microscope and the cleaned surfaces of silicon wafers during their treatment with isopropyl alcohol and distilled water were investigated experimentally. It was shown that the presence of water molecules on the surface of the substrates leads to a significant (approximately 5 times) change in the value of these forces. It was found that the use of AFM allows the relative magnitude of friction forces in small areas of silicon wafer surfaces to be estimated.http://computeroptics.smr.ru/KO/PDF/KO43-3/430320.pdfatomic force microscopysilicon waferstribometric properties
spellingShingle Igor Mikheev
Faat Vakhitov
The use of atomic force microscopy to assess the quality of cleaning and tribometric properties of a silicon wafer surface
Компьютерная оптика
atomic force microscopy
silicon wafers
tribometric properties
title The use of atomic force microscopy to assess the quality of cleaning and tribometric properties of a silicon wafer surface
title_full The use of atomic force microscopy to assess the quality of cleaning and tribometric properties of a silicon wafer surface
title_fullStr The use of atomic force microscopy to assess the quality of cleaning and tribometric properties of a silicon wafer surface
title_full_unstemmed The use of atomic force microscopy to assess the quality of cleaning and tribometric properties of a silicon wafer surface
title_short The use of atomic force microscopy to assess the quality of cleaning and tribometric properties of a silicon wafer surface
title_sort use of atomic force microscopy to assess the quality of cleaning and tribometric properties of a silicon wafer surface
topic atomic force microscopy
silicon wafers
tribometric properties
url http://computeroptics.smr.ru/KO/PDF/KO43-3/430320.pdf
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