Controlled formation of anatase and rutile TiO2 thin films by reactive magnetron sputtering

Controlled formation of anatase and rutile TiO2 thin films by reactive magnetron sputtering

We discuss the formation of TiO2 thin films via DC reactive magnetron sputtering. The oxygen concentration during sputtering proved to be a crucial parameter with respect to the final film structure and properties. The initial deposition provided amorphous films that crystallise upon annealing to an...

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Bibliographic Details
Main Authors:	Damon Rafieian, Wojciech Ogieglo, Tom Savenije, Rob G. H. Lammertink
Format:	Article
Language:	English
Published:	AIP Publishing LLC 2015-09-01
Series:	AIP Advances
Online Access:	http://dx.doi.org/10.1063/1.4931925

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