SLLB-DEVS: An Approach for DEVS Based Modeling of Semiconductor Lithography Load Balance
In industrial applications, software related to computational lithography using a DP system method, which refers to how efficiently hardware resources are used, has a significant impact on performance. Because the amount of data to be processed per unit of time is comparatively large in the current...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2021-05-01
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| Series: | Applied Sciences |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2076-3417/11/9/4235 |