Gold Nanoisland Agglomeration upon the Substrate Assisted Chemical Etching Based on Thermal Annealing Process

In this study, we proposed the self-organization process and its localized surface plasmon resonance property (LSPR) to study the effect of chemically treated quartz glass substrates for gold nanoisland array formation. Firstly, we etched a quartz glass substrate using a sputter etching machine. Sec...

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Bibliographic Details
Main Authors: Potejana Potejanasak, Sethavut Duangchan
Format: Article
Language:English
Published: MDPI AG 2020-06-01
Series:Crystals
Subjects:
Online Access:https://www.mdpi.com/2073-4352/10/6/533
Description
Summary:In this study, we proposed the self-organization process and its localized surface plasmon resonance property (LSPR) to study the effect of chemically treated quartz glass substrates for gold nanoisland array formation. Firstly, we etched a quartz glass substrate using a sputter etching machine. Secondly, n-butanol was treated on the surface of the substrate. Then, we deposited a gold thin film on the substrate with assisted chemical etching. Finally, the self-organization method examined the thermal annealing of gold nanoisland arrays on a substrate. The results showed that the gold nanoisland that was aggregated on an etched quartz glass substrate was large and sparse, while the gold nanoisland aggregated on a chemically treated substrate was small and dense. Further, it was revealed that a substrate’s surface energy reduced chemical treating and increased the gold nanoisland contact angle on the substrate via the thermal annealing process. It was also confirmed that chemical treatment was useful to control the morphology of gold nanoisland arrays on a substrate, particularly when related to tuning their optical property.
ISSN:2073-4352