Behavioral modeling of stressed MOSFET

In this paper piezoconductivity phenomenon in MOSFET channel is discussed and extension of drain current model with possibility of stress consideration is proposed. Analysis of obtained model combined with examination of stress components inherent in the MOSFET channel as well as distributions of sp...

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Main Author: Zenon Gniazdowski
Format: Article
Language:English
Published: Warsaw School of Computer Science 2015-12-01
Series:Zeszyty Naukowe Warszawskiej Wyższej Szkoły Informatyki
Subjects:
Online Access:http://zeszyty-naukowe.wwsi.edu.pl/zeszyty/zeszyt13/Behavioral_modeling_of_stressed_MOSFET.pdf
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author Zenon Gniazdowski
author_facet Zenon Gniazdowski
author_sort Zenon Gniazdowski
collection DOAJ
description In this paper piezoconductivity phenomenon in MOSFET channel is discussed and extension of drain current model with possibility of stress consideration is proposed. Analysis of obtained model combined with examination of stress components inherent in the MOSFET channel as well as distributions of specific piezoconductance coefficients on a plane of channel can show which directions of transistor channel are desirable for improvement of MOSFET performances. This model gives possibility to predict optimal transistor channel orientation, for the given stress state in MOSFET channel. Possible simplification of this model is considered. In particular, stress state and significant piezoconductance coefficient distributions on planes {100}, {110} as well as {111} are analyzed. For assumed particular cases of stress state in the channel, final models of MOSFT for considered specific planes are given.
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spelling doaj.art-39b80ac28b7f4344ad29971f618e416d2022-12-22T02:23:05ZengWarsaw School of Computer ScienceZeszyty Naukowe Warszawskiej Wyższej Szkoły Informatyki1896-396X2082-83492015-12-0191310312610.26348/znwwsi.13.103Behavioral modeling of stressed MOSFETZenon Gniazdowski0Warsaw School of Computer ScienceIn this paper piezoconductivity phenomenon in MOSFET channel is discussed and extension of drain current model with possibility of stress consideration is proposed. Analysis of obtained model combined with examination of stress components inherent in the MOSFET channel as well as distributions of specific piezoconductance coefficients on a plane of channel can show which directions of transistor channel are desirable for improvement of MOSFET performances. This model gives possibility to predict optimal transistor channel orientation, for the given stress state in MOSFET channel. Possible simplification of this model is considered. In particular, stress state and significant piezoconductance coefficient distributions on planes {100}, {110} as well as {111} are analyzed. For assumed particular cases of stress state in the channel, final models of MOSFT for considered specific planes are given.http://zeszyty-naukowe.wwsi.edu.pl/zeszyty/zeszyt13/Behavioral_modeling_of_stressed_MOSFET.pdfpiezoconductivitystressed mosfetstrained siliconmosfet modelspice model
spellingShingle Zenon Gniazdowski
Behavioral modeling of stressed MOSFET
Zeszyty Naukowe Warszawskiej Wyższej Szkoły Informatyki
piezoconductivity
stressed mosfet
strained silicon
mosfet model
spice model
title Behavioral modeling of stressed MOSFET
title_full Behavioral modeling of stressed MOSFET
title_fullStr Behavioral modeling of stressed MOSFET
title_full_unstemmed Behavioral modeling of stressed MOSFET
title_short Behavioral modeling of stressed MOSFET
title_sort behavioral modeling of stressed mosfet
topic piezoconductivity
stressed mosfet
strained silicon
mosfet model
spice model
url http://zeszyty-naukowe.wwsi.edu.pl/zeszyty/zeszyt13/Behavioral_modeling_of_stressed_MOSFET.pdf
work_keys_str_mv AT zenongniazdowski behavioralmodelingofstressedmosfet