A study of the dependence of the reflectance of the anti-reflective material Ta2o5 on the wavelength of laser radiation
The study of the dependence of reflectance of the Ta2O5 antireflection coating with wavelength. Experiments were carried out using spectrophotometer based on a prismatic monochromatic SPM covering the spectral rang 450 – 1000 nm. It can be seen from these results that the reflectance of the antire...
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Format: | Article |
Language: | Arabic |
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Tishreen University
2023-05-01
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Series: | مجلة جامعة تشرين للبحوث والدراسات العلمية، سلسلة العلوم الأساسية |
Online Access: | http://www.journal.tishreen.edu.sy/index.php/bassnc/article/view/14710 |
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author | bassam ghazolin |
author_facet | bassam ghazolin |
author_sort | bassam ghazolin |
collection | DOAJ |
description |
The study of the dependence of reflectance of the Ta2O5 antireflection coating with wavelength. Experiments were carried out using spectrophotometer based on a prismatic monochromatic SPM covering the spectral rang 450 – 1000 nm. It can be seen from these results that the reflectance of the antireflection layer of the unirradiated sample is less than 10 % the above mentioned spectral range and decreases as the wavelength decreases. Its value is about 7% at 1060 nm and 1-2% at 532 nm.
Irradiation of the si solar cell samples by laser pulses had been found to have an observable effect on the reflectance of their antireflection layer; the effect being dependent on the laser radiation wavelength and the number of pulses. For radiation of wavelength 1060 nm, the reflectance for the sample irradiation by a small number of pulses (l = 1060 nm 1 and 3 pulses) becomes ≈ 12%. Since this small number of pulses causes a small heating of the sample surface, in the increase of reflectance may be a result of some sort of cleaning process of the surface antireflection layer, which in turn causes the observed increase of reflectance. As the number of pulses at this wavelength is increased, the reflectance decreases. This is due to the thermal damage of the surface antireflection layer
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first_indexed | 2024-03-09T06:56:56Z |
format | Article |
id | doaj.art-3a299c3a6867412e8df429e0050369e2 |
institution | Directory Open Access Journal |
issn | 2079-3057 2663-4252 |
language | Arabic |
last_indexed | 2024-03-09T06:56:56Z |
publishDate | 2023-05-01 |
publisher | Tishreen University |
record_format | Article |
series | مجلة جامعة تشرين للبحوث والدراسات العلمية، سلسلة العلوم الأساسية |
spelling | doaj.art-3a299c3a6867412e8df429e0050369e22023-12-03T10:02:50ZaraTishreen Universityمجلة جامعة تشرين للبحوث والدراسات العلمية، سلسلة العلوم الأساسية2079-30572663-42522023-05-01452A study of the dependence of the reflectance of the anti-reflective material Ta2o5 on the wavelength of laser radiationbassam ghazolin0tishreen university The study of the dependence of reflectance of the Ta2O5 antireflection coating with wavelength. Experiments were carried out using spectrophotometer based on a prismatic monochromatic SPM covering the spectral rang 450 – 1000 nm. It can be seen from these results that the reflectance of the antireflection layer of the unirradiated sample is less than 10 % the above mentioned spectral range and decreases as the wavelength decreases. Its value is about 7% at 1060 nm and 1-2% at 532 nm. Irradiation of the si solar cell samples by laser pulses had been found to have an observable effect on the reflectance of their antireflection layer; the effect being dependent on the laser radiation wavelength and the number of pulses. For radiation of wavelength 1060 nm, the reflectance for the sample irradiation by a small number of pulses (l = 1060 nm 1 and 3 pulses) becomes ≈ 12%. Since this small number of pulses causes a small heating of the sample surface, in the increase of reflectance may be a result of some sort of cleaning process of the surface antireflection layer, which in turn causes the observed increase of reflectance. As the number of pulses at this wavelength is increased, the reflectance decreases. This is due to the thermal damage of the surface antireflection layer http://www.journal.tishreen.edu.sy/index.php/bassnc/article/view/14710 |
spellingShingle | bassam ghazolin A study of the dependence of the reflectance of the anti-reflective material Ta2o5 on the wavelength of laser radiation مجلة جامعة تشرين للبحوث والدراسات العلمية، سلسلة العلوم الأساسية |
title | A study of the dependence of the reflectance of the anti-reflective material Ta2o5 on the wavelength of laser radiation |
title_full | A study of the dependence of the reflectance of the anti-reflective material Ta2o5 on the wavelength of laser radiation |
title_fullStr | A study of the dependence of the reflectance of the anti-reflective material Ta2o5 on the wavelength of laser radiation |
title_full_unstemmed | A study of the dependence of the reflectance of the anti-reflective material Ta2o5 on the wavelength of laser radiation |
title_short | A study of the dependence of the reflectance of the anti-reflective material Ta2o5 on the wavelength of laser radiation |
title_sort | study of the dependence of the reflectance of the anti reflective material ta2o5 on the wavelength of laser radiation |
url | http://www.journal.tishreen.edu.sy/index.php/bassnc/article/view/14710 |
work_keys_str_mv | AT bassamghazolin astudyofthedependenceofthereflectanceoftheantireflectivematerialta2o5onthewavelengthoflaserradiation AT bassamghazolin studyofthedependenceofthereflectanceoftheantireflectivematerialta2o5onthewavelengthoflaserradiation |