Compact and Low Crosstalk Echelle Grating Demultiplexer on Silicon-On-Insulator Technology

Compact and Low Crosstalk Echelle Grating Demultiplexer on Silicon-On-Insulator Technology

We report on the design of an ultra-compact integrated wavelength demultiplexer in echelle configuration for the optical O-band realized on silicon-on-insulator technology. The device has four channels with channel spacing of 800 GHz and a small footprint of 260 &#215; 83 &#956;m<sup>2...

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Bibliographic Details
Main Authors: Daniele Melati, Pierre G. Verly, André Delâge, Shurui Wang, Jean Lapointe, Pavel Cheben, Jens H. Schmid, Siegfried Janz, Dan-Xia Xu
Format: Article
Language:English
Published: MDPI AG 2019-06-01
Series:Electronics
Subjects:
demultiplexer
wavelength division multiplexing (WDM)
silicon-on-insulator (SOI)
integrated photonics
optical o-band
echelle
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Online Access:https://www.mdpi.com/2079-9292/8/6/687
Description
Summary:We report on the design of an ultra-compact integrated wavelength demultiplexer in echelle configuration for the optical O-band realized on silicon-on-insulator technology. The device has four channels with channel spacing of 800 GHz and a small footprint of 260 &#215; 83 &#956;m<sup>2</sup>. Channel crosstalk lower than &#8722;28 dB across the four channels is experimentally demonstrated along with insertion losses of &#8722;1.5 dB.
ISSN:2079-9292

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