Nanocolumnar Preferentially Oriented PSZT Thin Films Deposited on Thermally Grown Silicon Dioxide

<p>Abstract</p> <p>We report the first instance of deposition of preferentially oriented, nanocrystalline, and nanocolumnar strontium-doped lead zirconate titanate (PSZT) ferroelectric thin films directly on thermal silicon dioxide. No intermediate seed or activation layers were us...

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Main Authors: Mitchell DRG, Sriram S, Bhaskaran M, Mitchell A, Kostovski G
Format: Article
Language:English
Published: SpringerOpen 2008-01-01
Series:Nanoscale Research Letters
Subjects:
Online Access:http://dx.doi.org/10.1007/s11671-008-9197-2
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author Mitchell DRG
Sriram S
Bhaskaran M
Mitchell A
Kostovski G
author_facet Mitchell DRG
Sriram S
Bhaskaran M
Mitchell A
Kostovski G
author_sort Mitchell DRG
collection DOAJ
description <p>Abstract</p> <p>We report the first instance of deposition of preferentially oriented, nanocrystalline, and nanocolumnar strontium-doped lead zirconate titanate (PSZT) ferroelectric thin films directly on thermal silicon dioxide. No intermediate seed or activation layers were used between PSZT and silicon dioxide. The deposited thin films have been characterised using a combination of diffraction and microscopy techniques.</p>
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spelling doaj.art-3b10cae383284e78856c54399d1df91f2023-08-02T07:47:35ZengSpringerOpenNanoscale Research Letters1931-75731556-276X2008-01-01412933Nanocolumnar Preferentially Oriented PSZT Thin Films Deposited on Thermally Grown Silicon DioxideMitchell DRGSriram SBhaskaran MMitchell AKostovski G<p>Abstract</p> <p>We report the first instance of deposition of preferentially oriented, nanocrystalline, and nanocolumnar strontium-doped lead zirconate titanate (PSZT) ferroelectric thin films directly on thermal silicon dioxide. No intermediate seed or activation layers were used between PSZT and silicon dioxide. The deposited thin films have been characterised using a combination of diffraction and microscopy techniques.</p>http://dx.doi.org/10.1007/s11671-008-9197-2PSZT thin filmsSilicon dioxideNanocrystalXRDMicroscopy
spellingShingle Mitchell DRG
Sriram S
Bhaskaran M
Mitchell A
Kostovski G
Nanocolumnar Preferentially Oriented PSZT Thin Films Deposited on Thermally Grown Silicon Dioxide
Nanoscale Research Letters
PSZT thin films
Silicon dioxide
Nanocrystal
XRD
Microscopy
title Nanocolumnar Preferentially Oriented PSZT Thin Films Deposited on Thermally Grown Silicon Dioxide
title_full Nanocolumnar Preferentially Oriented PSZT Thin Films Deposited on Thermally Grown Silicon Dioxide
title_fullStr Nanocolumnar Preferentially Oriented PSZT Thin Films Deposited on Thermally Grown Silicon Dioxide
title_full_unstemmed Nanocolumnar Preferentially Oriented PSZT Thin Films Deposited on Thermally Grown Silicon Dioxide
title_short Nanocolumnar Preferentially Oriented PSZT Thin Films Deposited on Thermally Grown Silicon Dioxide
title_sort nanocolumnar preferentially oriented pszt thin films deposited on thermally grown silicon dioxide
topic PSZT thin films
Silicon dioxide
Nanocrystal
XRD
Microscopy
url http://dx.doi.org/10.1007/s11671-008-9197-2
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AT bhaskaranm nanocolumnarpreferentiallyorientedpsztthinfilmsdepositedonthermallygrownsilicondioxide
AT mitchella nanocolumnarpreferentiallyorientedpsztthinfilmsdepositedonthermallygrownsilicondioxide
AT kostovskig nanocolumnarpreferentiallyorientedpsztthinfilmsdepositedonthermallygrownsilicondioxide