Combination of Multiple Operando and In-Situ Characterization Techniques in a Single Cluster System for Atomic Layer Deposition: Unraveling the Early Stages of Growth of Ultrathin Al<sub>2</sub>O<sub>3</sub> Films on Metallic Ti Substrates

Combination of Multiple Operando and In-Situ Characterization Techniques in a Single Cluster System for Atomic Layer Deposition: Unraveling the Early Stages of Growth of Ultrathin Al<sub>2</sub>O<sub>3</sub> Films on Metallic Ti Substrates

This work presents a new ultra-high vacuum cluster tool to perform systematic studies of the early growth stages of atomic layer deposited (ALD) ultrathin films following a surface science approach. By combining operando (spectroscopic ellipsometry and quadrupole mass spectrometry) and in situ (X-ra...

Disgrifiad llawn

Manylion Llyfryddiaeth
Prif Awduron: Carlos Morales, Ali Mahmoodinezhad, Rudi Tschammer, Julia Kosto, Carlos Alvarado Chavarin, Markus Andreas Schubert, Christian Wenger, Karsten Henkel, Jan Ingo Flege
Fformat: Erthygl
Iaith:English
Cyhoeddwyd: MDPI AG 2023-12-01
Cyfres:Inorganics
Pynciau:
ALD
in-situ
operando
XPS
ellipsometry
QMS
Mynediad Ar-lein:https://www.mdpi.com/2304-6740/11/12/477

Rhyngrwyd

https://www.mdpi.com/2304-6740/11/12/477

Eitemau Tebyg