Combination of Multiple Operando and In-Situ Characterization Techniques in a Single Cluster System for Atomic Layer Deposition: Unraveling the Early Stages of Growth of Ultrathin Al<sub>2</sub>O<sub>3</sub> Films on Metallic Ti Substrates

Combination of Multiple Operando and In-Situ Characterization Techniques in a Single Cluster System for Atomic Layer Deposition: Unraveling the Early Stages of Growth of Ultrathin Al<sub>2</sub>O<sub>3</sub> Films on Metallic Ti Substrates

This work presents a new ultra-high vacuum cluster tool to perform systematic studies of the early growth stages of atomic layer deposited (ALD) ultrathin films following a surface science approach. By combining operando (spectroscopic ellipsometry and quadrupole mass spectrometry) and in situ (X-ra...

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Príomhchruthaitheoirí: Carlos Morales, Ali Mahmoodinezhad, Rudi Tschammer, Julia Kosto, Carlos Alvarado Chavarin, Markus Andreas Schubert, Christian Wenger, Karsten Henkel, Jan Ingo Flege
Formáid: Alt
Teanga:English
Foilsithe / Cruthaithe: MDPI AG 2023-12-01
Sraith:Inorganics
Ábhair:
ALD
in-situ
operando
XPS
ellipsometry
QMS
Rochtain ar líne:https://www.mdpi.com/2304-6740/11/12/477

Ar líne

https://www.mdpi.com/2304-6740/11/12/477

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