Combination of Multiple Operando and In-Situ Characterization Techniques in a Single Cluster System for Atomic Layer Deposition: Unraveling the Early Stages of Growth of Ultrathin Al<sub>2</sub>O<sub>3</sub> Films on Metallic Ti Substrates

Combination of Multiple Operando and In-Situ Characterization Techniques in a Single Cluster System for Atomic Layer Deposition: Unraveling the Early Stages of Growth of Ultrathin Al<sub>2</sub>O<sub>3</sub> Films on Metallic Ti Substrates

This work presents a new ultra-high vacuum cluster tool to perform systematic studies of the early growth stages of atomic layer deposited (ALD) ultrathin films following a surface science approach. By combining operando (spectroscopic ellipsometry and quadrupole mass spectrometry) and in situ (X-ra...

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Chi tiết về thư mục
Những tác giả chính: Carlos Morales, Ali Mahmoodinezhad, Rudi Tschammer, Julia Kosto, Carlos Alvarado Chavarin, Markus Andreas Schubert, Christian Wenger, Karsten Henkel, Jan Ingo Flege
Định dạng: Bài viết
Ngôn ngữ:English
Được phát hành: MDPI AG 2023-12-01
Loạt:Inorganics
Những chủ đề:
ALD
in-situ
operando
XPS
ellipsometry
QMS
Truy cập trực tuyến:https://www.mdpi.com/2304-6740/11/12/477

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https://www.mdpi.com/2304-6740/11/12/477

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