Protons: Critical Species for Resistive Switching in Interface‐Type Memristors

Abstract Interface‐type (IT) resistive switching (RS) memories are promising for next generation memory and computing technologies owing to the filament‐free switching, high on/off ratio, low power consumption, and low spatial variability. Although the switching mechanisms of memristors have been wi...

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Main Authors: Sundar Kunwar, Chase Bennett Somodi, Rebecca A. Lalk, Bethany X. Rutherford, Zachary Corey, Pinku Roy, Di Zhang, Markus Hellenbrand, Ming Xiao, Judith L. MacManus‐Driscoll, Quanxi Jia, Haiyan Wang, J. Joshua Yang, Wanyi Nie, Aiping Chen
Format: Article
Language:English
Published: Wiley-VCH 2023-01-01
Series:Advanced Electronic Materials
Subjects:
Online Access:https://doi.org/10.1002/aelm.202200816
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author Sundar Kunwar
Chase Bennett Somodi
Rebecca A. Lalk
Bethany X. Rutherford
Zachary Corey
Pinku Roy
Di Zhang
Markus Hellenbrand
Ming Xiao
Judith L. MacManus‐Driscoll
Quanxi Jia
Haiyan Wang
J. Joshua Yang
Wanyi Nie
Aiping Chen
author_facet Sundar Kunwar
Chase Bennett Somodi
Rebecca A. Lalk
Bethany X. Rutherford
Zachary Corey
Pinku Roy
Di Zhang
Markus Hellenbrand
Ming Xiao
Judith L. MacManus‐Driscoll
Quanxi Jia
Haiyan Wang
J. Joshua Yang
Wanyi Nie
Aiping Chen
author_sort Sundar Kunwar
collection DOAJ
description Abstract Interface‐type (IT) resistive switching (RS) memories are promising for next generation memory and computing technologies owing to the filament‐free switching, high on/off ratio, low power consumption, and low spatial variability. Although the switching mechanisms of memristors have been widely studied in filament‐type devices, they are largely unknown in IT memristors. In this work, using the simple Au/Nb:SrTiO3 (Nb:STO) as a model Schottky system, it is identified that protons from moisture are key element in determining the RS characteristics in IT memristors. The Au/Nb:STO devices show typical Schottky interface controlled current–voltage (I–V) curves with a large on/off ratio under ambient conditions. Surprisingly, in a controlled environment without protons/moisture, the large I–V hysteresis collapses with the disappearance of a high resistance state (HRS) and the Schottky barrier. Once the devices are re‐exposed to a humid environment, the typical large I–V hysteresis can be recovered within hours as the HRS and Schottky interface are restored. The RS mechanism in Au/Nb:STO is attributed to the Schottky barrier modulation by a proton assisted electron trapping and detrapping process. This work highlights the important role of protons/moisture in the RS properties of IT memristors and provides fundamental insight for switching mechanisms in metal oxides‐based memory devices.
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spelling doaj.art-3d9b2711184d4c49929a092594e68df62023-07-26T01:35:51ZengWiley-VCHAdvanced Electronic Materials2199-160X2023-01-0191n/an/a10.1002/aelm.202200816Protons: Critical Species for Resistive Switching in Interface‐Type MemristorsSundar Kunwar0Chase Bennett Somodi1Rebecca A. Lalk2Bethany X. Rutherford3Zachary Corey4Pinku Roy5Di Zhang6Markus Hellenbrand7Ming Xiao8Judith L. MacManus‐Driscoll9Quanxi Jia10Haiyan Wang11J. Joshua Yang12Wanyi Nie13Aiping Chen14Center for Integrated Nanotechnologies (CINT) Los Alamos National Laboratory Los Alamos NM 87545 USACenter for Integrated Nanotechnologies (CINT) Los Alamos National Laboratory Los Alamos NM 87545 USACenter for Integrated Nanotechnologies (CINT) Los Alamos National Laboratory Los Alamos NM 87545 USACenter for Integrated Nanotechnologies (CINT) Los Alamos National Laboratory Los Alamos NM 87545 USADepartment of Materials Design and Innovation University at Buffalo – The State University of New York Buffalo NY 14260 USADepartment of Materials Design and Innovation University at Buffalo – The State University of New York Buffalo NY 14260 USACenter for Integrated Nanotechnologies (CINT) Los Alamos National Laboratory Los Alamos NM 87545 USADepartment of Materials Science and Metallurgy University of Cambridge 27 Charles Babbage Road Cambridge CB3 0FS UKDepartment of Materials Science and Metallurgy University of Cambridge 27 Charles Babbage Road Cambridge CB3 0FS UKDepartment of Materials Science and Metallurgy University of Cambridge 27 Charles Babbage Road Cambridge CB3 0FS UKDepartment of Materials Design and Innovation University at Buffalo – The State University of New York Buffalo NY 14260 USASchool of Materials Engineering Purdue University West Lafayette IN 47907 USADepartment of Electrical and Computer Engineering University of Southern California Los Angeles CA 90089 USACenter for Integrated Nanotechnologies (CINT) Los Alamos National Laboratory Los Alamos NM 87545 USACenter for Integrated Nanotechnologies (CINT) Los Alamos National Laboratory Los Alamos NM 87545 USAAbstract Interface‐type (IT) resistive switching (RS) memories are promising for next generation memory and computing technologies owing to the filament‐free switching, high on/off ratio, low power consumption, and low spatial variability. Although the switching mechanisms of memristors have been widely studied in filament‐type devices, they are largely unknown in IT memristors. In this work, using the simple Au/Nb:SrTiO3 (Nb:STO) as a model Schottky system, it is identified that protons from moisture are key element in determining the RS characteristics in IT memristors. The Au/Nb:STO devices show typical Schottky interface controlled current–voltage (I–V) curves with a large on/off ratio under ambient conditions. Surprisingly, in a controlled environment without protons/moisture, the large I–V hysteresis collapses with the disappearance of a high resistance state (HRS) and the Schottky barrier. Once the devices are re‐exposed to a humid environment, the typical large I–V hysteresis can be recovered within hours as the HRS and Schottky interface are restored. The RS mechanism in Au/Nb:STO is attributed to the Schottky barrier modulation by a proton assisted electron trapping and detrapping process. This work highlights the important role of protons/moisture in the RS properties of IT memristors and provides fundamental insight for switching mechanisms in metal oxides‐based memory devices.https://doi.org/10.1002/aelm.202200816Au/Nb:STOcharge trapping/detrappinginterface‐type memristorsmoisture effectresistive switching
spellingShingle Sundar Kunwar
Chase Bennett Somodi
Rebecca A. Lalk
Bethany X. Rutherford
Zachary Corey
Pinku Roy
Di Zhang
Markus Hellenbrand
Ming Xiao
Judith L. MacManus‐Driscoll
Quanxi Jia
Haiyan Wang
J. Joshua Yang
Wanyi Nie
Aiping Chen
Protons: Critical Species for Resistive Switching in Interface‐Type Memristors
Advanced Electronic Materials
Au/Nb:STO
charge trapping/detrapping
interface‐type memristors
moisture effect
resistive switching
title Protons: Critical Species for Resistive Switching in Interface‐Type Memristors
title_full Protons: Critical Species for Resistive Switching in Interface‐Type Memristors
title_fullStr Protons: Critical Species for Resistive Switching in Interface‐Type Memristors
title_full_unstemmed Protons: Critical Species for Resistive Switching in Interface‐Type Memristors
title_short Protons: Critical Species for Resistive Switching in Interface‐Type Memristors
title_sort protons critical species for resistive switching in interface type memristors
topic Au/Nb:STO
charge trapping/detrapping
interface‐type memristors
moisture effect
resistive switching
url https://doi.org/10.1002/aelm.202200816
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