Sizing of SRAM Cell with Voltage Biasing Techniques for Reliability Enhancement of Memory and PUF Functions

Static Random Access Memory (SRAM) has recently been developed into a physical unclonable function (PUF) for generating chip-unique signatures for hardware cryptography. The most compelling issue in designing a good SRAM-based PUF (SPUF) is that while maximizing the mismatches between the transistor...

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Main Authors: Chip-Hong Chang, Chao Qun Liu, Le Zhang, Zhi Hui Kong
Format: Article
Language:English
Published: MDPI AG 2016-08-01
Series:Journal of Low Power Electronics and Applications
Subjects:
Online Access:http://www.mdpi.com/2079-9268/6/3/16
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author Chip-Hong Chang
Chao Qun Liu
Le Zhang
Zhi Hui Kong
author_facet Chip-Hong Chang
Chao Qun Liu
Le Zhang
Zhi Hui Kong
author_sort Chip-Hong Chang
collection DOAJ
description Static Random Access Memory (SRAM) has recently been developed into a physical unclonable function (PUF) for generating chip-unique signatures for hardware cryptography. The most compelling issue in designing a good SRAM-based PUF (SPUF) is that while maximizing the mismatches between the transistors in the cross-coupled inverters improves the quality of the SPUF, this ironically also gives rise to increased memory read/write failures. For this reason, the memory cells of existing SPUFs cannot be reused as storage elements, which increases the overheads of cryptographic system where long signatures and high-density storage are both required. This paper presents a novel design methodology for dual-mode SRAM cell optimization. The design conflicts are resolved by using word-line voltage modulation, dynamic voltage scaling, negative bit-line and adaptive body bias techniques to compensate for reliability degradation due to transistor downsizing. The augmented circuit-level techniques expand the design space to achieve a good solution to fulfill several otherwise contradicting key design qualities for both modes of operation, as evinced by our statistical analysis and simulation results based on complementary metal–oxide–semiconductor (CMOS) 45 nm bulk Predictive Technology Model.
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spelling doaj.art-3dd776efe77a4208b04bc15ec65e6ffb2022-12-22T04:09:51ZengMDPI AGJournal of Low Power Electronics and Applications2079-92682016-08-01631610.3390/jlpea6030016jlpea6030016Sizing of SRAM Cell with Voltage Biasing Techniques for Reliability Enhancement of Memory and PUF FunctionsChip-Hong Chang0Chao Qun Liu1Le Zhang2Zhi Hui Kong3School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore 639798, SingaporeSchool of Electrical and Electronic Engineering, Nanyang Technological University, Singapore 639798, SingaporeSchool of Electrical and Electronic Engineering, Nanyang Technological University, Singapore 639798, SingaporeSchool of Electrical and Electronic Engineering, Nanyang Technological University, Singapore 639798, SingaporeStatic Random Access Memory (SRAM) has recently been developed into a physical unclonable function (PUF) for generating chip-unique signatures for hardware cryptography. The most compelling issue in designing a good SRAM-based PUF (SPUF) is that while maximizing the mismatches between the transistors in the cross-coupled inverters improves the quality of the SPUF, this ironically also gives rise to increased memory read/write failures. For this reason, the memory cells of existing SPUFs cannot be reused as storage elements, which increases the overheads of cryptographic system where long signatures and high-density storage are both required. This paper presents a novel design methodology for dual-mode SRAM cell optimization. The design conflicts are resolved by using word-line voltage modulation, dynamic voltage scaling, negative bit-line and adaptive body bias techniques to compensate for reliability degradation due to transistor downsizing. The augmented circuit-level techniques expand the design space to achieve a good solution to fulfill several otherwise contradicting key design qualities for both modes of operation, as evinced by our statistical analysis and simulation results based on complementary metal–oxide–semiconductor (CMOS) 45 nm bulk Predictive Technology Model.http://www.mdpi.com/2079-9268/6/3/16physical unclonable function (PUF)hardware securityStatic Random Access Memory (SRAM)process variationmemory failures
spellingShingle Chip-Hong Chang
Chao Qun Liu
Le Zhang
Zhi Hui Kong
Sizing of SRAM Cell with Voltage Biasing Techniques for Reliability Enhancement of Memory and PUF Functions
Journal of Low Power Electronics and Applications
physical unclonable function (PUF)
hardware security
Static Random Access Memory (SRAM)
process variation
memory failures
title Sizing of SRAM Cell with Voltage Biasing Techniques for Reliability Enhancement of Memory and PUF Functions
title_full Sizing of SRAM Cell with Voltage Biasing Techniques for Reliability Enhancement of Memory and PUF Functions
title_fullStr Sizing of SRAM Cell with Voltage Biasing Techniques for Reliability Enhancement of Memory and PUF Functions
title_full_unstemmed Sizing of SRAM Cell with Voltage Biasing Techniques for Reliability Enhancement of Memory and PUF Functions
title_short Sizing of SRAM Cell with Voltage Biasing Techniques for Reliability Enhancement of Memory and PUF Functions
title_sort sizing of sram cell with voltage biasing techniques for reliability enhancement of memory and puf functions
topic physical unclonable function (PUF)
hardware security
Static Random Access Memory (SRAM)
process variation
memory failures
url http://www.mdpi.com/2079-9268/6/3/16
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