Kinetics of alkali-based photocathode degradation
We report on a kinetic model that describes the degradation of the quantum efficiency (QE) of Cs3Sb and negative electron affinity (NEA) GaAs photocathodes under UHV conditions. In addition to the generally accepted irreversible chemical change of a photocathode’s surface due to reactions with resid...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
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AIP Publishing LLC
2016-11-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.4967349 |
| _version_ | 1828417583267708928 |
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| author | Vitaly Pavlenko Fangze Liu Mark A. Hoffbauer Nathan A. Moody Enrique R. Batista |
| author_facet | Vitaly Pavlenko Fangze Liu Mark A. Hoffbauer Nathan A. Moody Enrique R. Batista |
| author_sort | Vitaly Pavlenko |
| collection | DOAJ |
| description | We report on a kinetic model that describes the degradation of the quantum efficiency (QE) of Cs3Sb and negative electron affinity (NEA) GaAs photocathodes under UHV conditions. In addition to the generally accepted irreversible chemical change of a photocathode’s surface due to reactions with residual gases, such as O2, CO2, and H2O, the model incorporates an intermediate reversible physisorption step, similar to Langmuir adsorption. This intermediate step is needed to satisfactorily describe the strongly non-exponential QE degradation curves for two distinctly different classes of photocathodes –surface-activated and “bulk,” indicating that in both systems the QE degradation results from surface damage. The recovery of the QE upon improvement of vacuum conditions is also accurately predicted by this model with three parameters (rates of gas adsorption, desorption, and irreversible chemical reaction with the surface) comprising metrics to better characterize the lifetime of the cathodes, instead of time-pressure exposure expressed in Langmuir units. |
| first_indexed | 2024-12-10T14:22:06Z |
| format | Article |
| id | doaj.art-3e28597708ae41f283d22000affab190 |
| institution | Directory Open Access Journal |
| issn | 2158-3226 |
| language | English |
| last_indexed | 2024-12-10T14:22:06Z |
| publishDate | 2016-11-01 |
| publisher | AIP Publishing LLC |
| record_format | Article |
| series | AIP Advances |
| spelling | doaj.art-3e28597708ae41f283d22000affab1902022-12-22T01:45:09ZengAIP Publishing LLCAIP Advances2158-32262016-11-01611115008115008-610.1063/1.4967349025611ADVKinetics of alkali-based photocathode degradationVitaly Pavlenko0Fangze Liu1Mark A. Hoffbauer2Nathan A. Moody3Enrique R. Batista4Accelerator Operations and Technology Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545, USAMaterials Physics and Applications Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545, USAChemistry Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545, USAAccelerator Operations and Technology Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545, USATheoretical Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545, USAWe report on a kinetic model that describes the degradation of the quantum efficiency (QE) of Cs3Sb and negative electron affinity (NEA) GaAs photocathodes under UHV conditions. In addition to the generally accepted irreversible chemical change of a photocathode’s surface due to reactions with residual gases, such as O2, CO2, and H2O, the model incorporates an intermediate reversible physisorption step, similar to Langmuir adsorption. This intermediate step is needed to satisfactorily describe the strongly non-exponential QE degradation curves for two distinctly different classes of photocathodes –surface-activated and “bulk,” indicating that in both systems the QE degradation results from surface damage. The recovery of the QE upon improvement of vacuum conditions is also accurately predicted by this model with three parameters (rates of gas adsorption, desorption, and irreversible chemical reaction with the surface) comprising metrics to better characterize the lifetime of the cathodes, instead of time-pressure exposure expressed in Langmuir units.http://dx.doi.org/10.1063/1.4967349 |
| spellingShingle | Vitaly Pavlenko Fangze Liu Mark A. Hoffbauer Nathan A. Moody Enrique R. Batista Kinetics of alkali-based photocathode degradation AIP Advances |
| title | Kinetics of alkali-based photocathode degradation |
| title_full | Kinetics of alkali-based photocathode degradation |
| title_fullStr | Kinetics of alkali-based photocathode degradation |
| title_full_unstemmed | Kinetics of alkali-based photocathode degradation |
| title_short | Kinetics of alkali-based photocathode degradation |
| title_sort | kinetics of alkali based photocathode degradation |
| url | http://dx.doi.org/10.1063/1.4967349 |
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