Amorphous SiC Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition for Passivation in Biomedical Devices
Amorphous silicon carbide (a-SiC) is a wide-bandgap semiconductor with high robustness and biocompatibility, making it a promising material for applications in biomedical device passivation. a-SiC thin film deposition has been a subject of research for several decades with a variety of approaches in...
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| Format: | Article |
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MDPI AG
2024-02-01
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| Series: | Materials |
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| Online Access: | https://www.mdpi.com/1996-1944/17/5/1135 |
| _version_ | 1797264208523427840 |
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| author | Scott Greenhorn Edwige Bano Valérie Stambouli Konstantinos Zekentes |
| author_facet | Scott Greenhorn Edwige Bano Valérie Stambouli Konstantinos Zekentes |
| author_sort | Scott Greenhorn |
| collection | DOAJ |
| description | Amorphous silicon carbide (a-SiC) is a wide-bandgap semiconductor with high robustness and biocompatibility, making it a promising material for applications in biomedical device passivation. a-SiC thin film deposition has been a subject of research for several decades with a variety of approaches investigated to achieve optimal properties for multiple applications, with an emphasis on properties relevant to biomedical devices in the past decade. This review summarizes the results of many optimization studies, identifying strategies that have been used to achieve desirable film properties and discussing the proposed physical interpretations. In addition, divergent results from studies are contrasted, with attempts to reconcile the results, while areas of uncertainty are highlighted. |
| first_indexed | 2024-04-25T00:25:15Z |
| format | Article |
| id | doaj.art-3e73ec266678456ca51b656b395d56e9 |
| institution | Directory Open Access Journal |
| issn | 1996-1944 |
| language | English |
| last_indexed | 2024-04-25T00:25:15Z |
| publishDate | 2024-02-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Materials |
| spelling | doaj.art-3e73ec266678456ca51b656b395d56e92024-03-12T16:49:23ZengMDPI AGMaterials1996-19442024-02-01175113510.3390/ma17051135Amorphous SiC Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition for Passivation in Biomedical DevicesScott Greenhorn0Edwige Bano1Valérie Stambouli2Konstantinos Zekentes3The Institute of Electronic Structure and Laser of the Foundation for Research and Technology-Hellas (MRG-IESL/FORTH), GR-70013 Heraklion, GreeceCentre de Radiofréquences, Optique et Micro-nanoélectronique des Alpes, Université Grenoble Alpes, Centre National de la Recherche Scientifique, Institut Polytechnique de Grenoble, 38016 Grenoble, FranceLaboratoire des Matériaux et de la Génie Physique, Université Grenoble Alpes, Centre National de la Recherche Scientifique, Institut Polytechnique de Grenoble, 38016 Grenoble, FranceThe Institute of Electronic Structure and Laser of the Foundation for Research and Technology-Hellas (MRG-IESL/FORTH), GR-70013 Heraklion, GreeceAmorphous silicon carbide (a-SiC) is a wide-bandgap semiconductor with high robustness and biocompatibility, making it a promising material for applications in biomedical device passivation. a-SiC thin film deposition has been a subject of research for several decades with a variety of approaches investigated to achieve optimal properties for multiple applications, with an emphasis on properties relevant to biomedical devices in the past decade. This review summarizes the results of many optimization studies, identifying strategies that have been used to achieve desirable film properties and discussing the proposed physical interpretations. In addition, divergent results from studies are contrasted, with attempts to reconcile the results, while areas of uncertainty are highlighted.https://www.mdpi.com/1996-1944/17/5/1135a-SiCamorphousPECVDbiomedicalpassivation |
| spellingShingle | Scott Greenhorn Edwige Bano Valérie Stambouli Konstantinos Zekentes Amorphous SiC Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition for Passivation in Biomedical Devices Materials a-SiC amorphous PECVD biomedical passivation |
| title | Amorphous SiC Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition for Passivation in Biomedical Devices |
| title_full | Amorphous SiC Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition for Passivation in Biomedical Devices |
| title_fullStr | Amorphous SiC Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition for Passivation in Biomedical Devices |
| title_full_unstemmed | Amorphous SiC Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition for Passivation in Biomedical Devices |
| title_short | Amorphous SiC Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition for Passivation in Biomedical Devices |
| title_sort | amorphous sic thin films deposited by plasma enhanced chemical vapor deposition for passivation in biomedical devices |
| topic | a-SiC amorphous PECVD biomedical passivation |
| url | https://www.mdpi.com/1996-1944/17/5/1135 |
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