Study on Motion and Deposition of Nanoparticles in Rotary MOCVD Reactors of Gallium Nitride

Study on Motion and Deposition of Nanoparticles in Rotary MOCVD Reactors of Gallium Nitride

Nanoparticles have a negative effect on the preparation of Gallium Nitride (GaN) by Metal-Organic Chemical Vapor Deposition (MOCVD). We developed a particle tracking and particle-wall collision model coupled with the bulk gas flow solver to investigate the motion and deposition of nanoparticles in s...

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Bibliographic Details
Main Authors: Peng Su, Daihui Lu, Jinping Luo, Guangyu Zheng, Yukang Sun, Lijun Liu
Format: Article
Language:English
Published: MDPI AG 2023-08-01
Series:Crystals
Subjects:
computer simulation
fluid flows
metal-organic chemical vapor deposition
gallium nitride
Online Access:https://www.mdpi.com/2073-4352/13/9/1328

Internet

https://www.mdpi.com/2073-4352/13/9/1328

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