An Ultraviolet-Lithography-Assisted Sintering Method for Glass Microlens Array Fabrication

Glass microlens arrays (MLAs) have tremendous prospects in the fields of optical communication, sensing and high-sensitivity imaging for their excellent optical properties, high mechanical robustness and physicochemical stability. So far, glass MLAs are primarily fabricated using femtosecond laser m...

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Main Authors: Fangyuan Zuo, Shenghua Ma, Wei Zhao, Chenqian Yang, Ziyu Li, Chen Zhang, Jintao Bai
Format: Article
Language:English
Published: MDPI AG 2023-11-01
Series:Micromachines
Subjects:
Online Access:https://www.mdpi.com/2072-666X/14/11/2055
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author Fangyuan Zuo
Shenghua Ma
Wei Zhao
Chenqian Yang
Ziyu Li
Chen Zhang
Jintao Bai
author_facet Fangyuan Zuo
Shenghua Ma
Wei Zhao
Chenqian Yang
Ziyu Li
Chen Zhang
Jintao Bai
author_sort Fangyuan Zuo
collection DOAJ
description Glass microlens arrays (MLAs) have tremendous prospects in the fields of optical communication, sensing and high-sensitivity imaging for their excellent optical properties, high mechanical robustness and physicochemical stability. So far, glass MLAs are primarily fabricated using femtosecond laser modification assisted etching, in which the preparation procedure is time-consuming, with each concave-shaped microlens being processed using a femtosecond laser point by point. In this paper, a new method is proposed for implementing large-scale glass MLAs using glass particle sintering with the assistance of ultraviolet (UV) lithography. The glass particles are dispersed into the photoresist at first, and then immobilized as large-scaled micropillar arrays on quartz glass substrate using UV lithographing. Subsequently, the solidified photoresist is debinded and the glass particles are melted by means of sintering. By controlling the sintering conditions, the convex microlens will be self-assembled, attributed to the surface tension of the molten glass particles. Finally, MLAs with different focal lengths (0.12 to 0.2 mm) are successfully fabricated by utilizing different lithography masks. Meanwhile, we also present the optimization of the sintering parameter for eliminating the bubbles in the microlenses. The main factors that affect the focal length of the microlens and the image performance of the MLAs have been studied in detail.
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spelling doaj.art-3f6f0538e9d84ad1b225a329dd45b0cf2023-11-24T14:56:24ZengMDPI AGMicromachines2072-666X2023-11-011411205510.3390/mi14112055An Ultraviolet-Lithography-Assisted Sintering Method for Glass Microlens Array FabricationFangyuan Zuo0Shenghua Ma1Wei Zhao2Chenqian Yang3Ziyu Li4Chen Zhang5Jintao Bai6State Key Laboratory of Photon-Technology in Western China Energy, Xi’an 710127, ChinaInternational Collaborative Center on Photoelectric Technology and Nano Functional Materials, Xi’an 710127, ChinaState Key Laboratory of Photon-Technology in Western China Energy, Xi’an 710127, ChinaInternational Collaborative Center on Photoelectric Technology and Nano Functional Materials, Xi’an 710127, ChinaState Key Laboratory of Photon-Technology in Western China Energy, Xi’an 710127, ChinaState Key Laboratory of Photon-Technology in Western China Energy, Xi’an 710127, ChinaState Key Laboratory of Photon-Technology in Western China Energy, Xi’an 710127, ChinaGlass microlens arrays (MLAs) have tremendous prospects in the fields of optical communication, sensing and high-sensitivity imaging for their excellent optical properties, high mechanical robustness and physicochemical stability. So far, glass MLAs are primarily fabricated using femtosecond laser modification assisted etching, in which the preparation procedure is time-consuming, with each concave-shaped microlens being processed using a femtosecond laser point by point. In this paper, a new method is proposed for implementing large-scale glass MLAs using glass particle sintering with the assistance of ultraviolet (UV) lithography. The glass particles are dispersed into the photoresist at first, and then immobilized as large-scaled micropillar arrays on quartz glass substrate using UV lithographing. Subsequently, the solidified photoresist is debinded and the glass particles are melted by means of sintering. By controlling the sintering conditions, the convex microlens will be self-assembled, attributed to the surface tension of the molten glass particles. Finally, MLAs with different focal lengths (0.12 to 0.2 mm) are successfully fabricated by utilizing different lithography masks. Meanwhile, we also present the optimization of the sintering parameter for eliminating the bubbles in the microlenses. The main factors that affect the focal length of the microlens and the image performance of the MLAs have been studied in detail.https://www.mdpi.com/2072-666X/14/11/2055convex microlens arrayssinteringultraviolet lithographyglass particle
spellingShingle Fangyuan Zuo
Shenghua Ma
Wei Zhao
Chenqian Yang
Ziyu Li
Chen Zhang
Jintao Bai
An Ultraviolet-Lithography-Assisted Sintering Method for Glass Microlens Array Fabrication
Micromachines
convex microlens arrays
sintering
ultraviolet lithography
glass particle
title An Ultraviolet-Lithography-Assisted Sintering Method for Glass Microlens Array Fabrication
title_full An Ultraviolet-Lithography-Assisted Sintering Method for Glass Microlens Array Fabrication
title_fullStr An Ultraviolet-Lithography-Assisted Sintering Method for Glass Microlens Array Fabrication
title_full_unstemmed An Ultraviolet-Lithography-Assisted Sintering Method for Glass Microlens Array Fabrication
title_short An Ultraviolet-Lithography-Assisted Sintering Method for Glass Microlens Array Fabrication
title_sort ultraviolet lithography assisted sintering method for glass microlens array fabrication
topic convex microlens arrays
sintering
ultraviolet lithography
glass particle
url https://www.mdpi.com/2072-666X/14/11/2055
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