Solid-phase growth and structure of barium disilicide films on Si (111)

The paper presents the results of an experiment on the formation of thin films of barium disilicide (BaSi2) a promising material for solar cells using the method of solid-phase epitaxy. BaSi2 was formed in ultrahigh vacuum on silicon substrates with the use of template technology. At the final stag...

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Main Authors: V. L. Dubov, D. V. Fomin, N. G. Galkin
Format: Article
Language:English
Published: Samara National Research University 2016-07-01
Series:Вестник Самарского университета: Аэрокосмическая техника, технологии и машиностроение
Subjects:
Online Access:https://journals.ssau.ru/vestnik/article/viewFile/3066/3005
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author V. L. Dubov
D. V. Fomin
N. G. Galkin
author_facet V. L. Dubov
D. V. Fomin
N. G. Galkin
author_sort V. L. Dubov
collection DOAJ
description The paper presents the results of an experiment on the formation of thin films of barium disilicide (BaSi2) a promising material for solar cells using the method of solid-phase epitaxy. BaSi2 was formed in ultrahigh vacuum on silicon substrates with the use of template technology. At the final stage of the formation of nanostructures the films were recrystallized by annealing. The resulting thin films were investigated by in-situ methods: Auger electron spectroscopy and electron energy loss spectroscopy. Then ex-situ techniques were used: atomic force microscopy and X-ray diffraction. The latter method showed the presence of a-oriented barium disilicide in the film formed at the temperature of recrystallization T = 800 0 C. The spectra of Auger electrons and electron energy loss for the film are presented. The analysis of surface topology nanostructure obtained by atomic force microscopy shows that its surface roughness is comparable with the roughness of thin BaSi2 film samples formed by molecular beam epitaxy. The reason for a small amount of crystallites BaSi2 formed, as we see it, is low interdiffusion of barium and silicon atoms in the case of using the chosen method of forming a film. The use of the Ba and Si co-deposition technique, followed by recrystallization of the film at temperatures close to the temperature specified in the paper appears to be the solution of this problem.
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spelling doaj.art-400c4d26571046888c7c8e81f31d7c272022-12-21T18:48:07ZengSamara National Research UniversityВестник Самарского университета: Аэрокосмическая техника, технологии и машиностроение2542-04532541-75332016-07-0115211412110.18287/2412-7329-2016-15-2-114-1212885Solid-phase growth and structure of barium disilicide films on Si (111)V. L. Dubov0D. V. Fomin1N. G. Galkin2Scientific and Educational Center of Amur State University, BlagoveshchenskScientific and Educational Center of Amur State University, BlagoveshchenskScientific and Educational Center of Amur State University, BlagoveshchenskThe paper presents the results of an experiment on the formation of thin films of barium disilicide (BaSi2) a promising material for solar cells using the method of solid-phase epitaxy. BaSi2 was formed in ultrahigh vacuum on silicon substrates with the use of template technology. At the final stage of the formation of nanostructures the films were recrystallized by annealing. The resulting thin films were investigated by in-situ methods: Auger electron spectroscopy and electron energy loss spectroscopy. Then ex-situ techniques were used: atomic force microscopy and X-ray diffraction. The latter method showed the presence of a-oriented barium disilicide in the film formed at the temperature of recrystallization T = 800 0 C. The spectra of Auger electrons and electron energy loss for the film are presented. The analysis of surface topology nanostructure obtained by atomic force microscopy shows that its surface roughness is comparable with the roughness of thin BaSi2 film samples formed by molecular beam epitaxy. The reason for a small amount of crystallites BaSi2 formed, as we see it, is low interdiffusion of barium and silicon atoms in the case of using the chosen method of forming a film. The use of the Ba and Si co-deposition technique, followed by recrystallization of the film at temperatures close to the temperature specified in the paper appears to be the solution of this problem.https://journals.ssau.ru/vestnik/article/viewFile/3066/3005thin filmsnanotechnologysolar cellssolid-phase epitaxybarium disilicidesilicon
spellingShingle V. L. Dubov
D. V. Fomin
N. G. Galkin
Solid-phase growth and structure of barium disilicide films on Si (111)
Вестник Самарского университета: Аэрокосмическая техника, технологии и машиностроение
thin films
nanotechnology
solar cells
solid-phase epitaxy
barium disilicide
silicon
title Solid-phase growth and structure of barium disilicide films on Si (111)
title_full Solid-phase growth and structure of barium disilicide films on Si (111)
title_fullStr Solid-phase growth and structure of barium disilicide films on Si (111)
title_full_unstemmed Solid-phase growth and structure of barium disilicide films on Si (111)
title_short Solid-phase growth and structure of barium disilicide films on Si (111)
title_sort solid phase growth and structure of barium disilicide films on si 111
topic thin films
nanotechnology
solar cells
solid-phase epitaxy
barium disilicide
silicon
url https://journals.ssau.ru/vestnik/article/viewFile/3066/3005
work_keys_str_mv AT vldubov solidphasegrowthandstructureofbariumdisilicidefilmsonsi111
AT dvfomin solidphasegrowthandstructureofbariumdisilicidefilmsonsi111
AT nggalkin solidphasegrowthandstructureofbariumdisilicidefilmsonsi111