The effect of sputtering RF power on structural, optical and electrical properties of CuO and CuO2 thin films

The effect of sputtering RF power on structural, optical and electrical properties of CuO and CuO2 thin films

In this paper, the RF power change effect on the structural, optical and electrical properties of CuO thin films prepared by RF reactive magnetron sputtering deposited on glass substrates are studied. At first, the thin films are prepared at 150, 280, 310 and 340W respectively. Then, the films are c...

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Bibliographic Details
Main Authors: Alireza Razeghizadeh, Maryam Mahmudi Ghalavandi, Farhang Sohili, Vahdat Rafee
Format: Article
Language:English
Published: Nanoscience and Nanotechnology Research Center, University of Kashan 2019-04-01
Series:Journal of Nanostructures
Subjects:
rf reactive magnetron sputtering
copper oxide
afm
four-point probe
Online Access:http://jns.kashanu.ac.ir/article_88769_90b5ae1d6d81332c55bf5c4fd40fb160.pdf

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