Metal–insulator transitions in dimensionality controlled LaxSr1−xVO3 films

Carrier doping into two dimensional (2D) Mott insulators is one of the prospective strategies for exploring exotic quantum phenomena. Although ultra-thin oxide films are one such target, it is vitally important to fabricate well-defined and clean samples to extract intrinsic properties. In this stud...

Full description

Bibliographic Details
Main Authors: K. S. Takahashi, Y. Tokura, M. Kawasaki
Format: Article
Language:English
Published: AIP Publishing LLC 2022-11-01
Series:APL Materials
Online Access:http://dx.doi.org/10.1063/5.0122864
_version_ 1797947387356905472
author K. S. Takahashi
Y. Tokura
M. Kawasaki
author_facet K. S. Takahashi
Y. Tokura
M. Kawasaki
author_sort K. S. Takahashi
collection DOAJ
description Carrier doping into two dimensional (2D) Mott insulators is one of the prospective strategies for exploring exotic quantum phenomena. Although ultra-thin oxide films are one such target, it is vitally important to fabricate well-defined and clean samples to extract intrinsic properties. In this study, we start from establishing the growth of clean SrVO3 films with a low residual resistivity (∼4 × 10−7 Ω cm) and a high mobility (∼103 cm2/V s). By confining them with SrTiO3 barrier layers, the Mott insulator state appears at the thickness below 3 unit cells (u.c.). By the electron doping in the form of LaxSr1−xVO3 for such two dimensional systems (2 and 3 u.c), metallic-like phases appear in a narrow x region around x = 0.17, indicating a collapse of the Mott insulator state. This study demonstrates that artificial 2D systems of clean oxides are a promising playground for exploring novel Mott physics in confined systems.
first_indexed 2024-04-10T21:26:56Z
format Article
id doaj.art-4447cce96cc84ca8b3d46cef80400456
institution Directory Open Access Journal
issn 2166-532X
language English
last_indexed 2024-04-10T21:26:56Z
publishDate 2022-11-01
publisher AIP Publishing LLC
record_format Article
series APL Materials
spelling doaj.art-4447cce96cc84ca8b3d46cef804004562023-01-19T16:28:28ZengAIP Publishing LLCAPL Materials2166-532X2022-11-011011111114111114-510.1063/5.0122864Metal–insulator transitions in dimensionality controlled LaxSr1−xVO3 filmsK. S. Takahashi0Y. Tokura1M. Kawasaki2RIKEN Center for Emergent Matter Science (CEMS), Wako 351-0198, JapanRIKEN Center for Emergent Matter Science (CEMS), Wako 351-0198, JapanRIKEN Center for Emergent Matter Science (CEMS), Wako 351-0198, JapanCarrier doping into two dimensional (2D) Mott insulators is one of the prospective strategies for exploring exotic quantum phenomena. Although ultra-thin oxide films are one such target, it is vitally important to fabricate well-defined and clean samples to extract intrinsic properties. In this study, we start from establishing the growth of clean SrVO3 films with a low residual resistivity (∼4 × 10−7 Ω cm) and a high mobility (∼103 cm2/V s). By confining them with SrTiO3 barrier layers, the Mott insulator state appears at the thickness below 3 unit cells (u.c.). By the electron doping in the form of LaxSr1−xVO3 for such two dimensional systems (2 and 3 u.c), metallic-like phases appear in a narrow x region around x = 0.17, indicating a collapse of the Mott insulator state. This study demonstrates that artificial 2D systems of clean oxides are a promising playground for exploring novel Mott physics in confined systems.http://dx.doi.org/10.1063/5.0122864
spellingShingle K. S. Takahashi
Y. Tokura
M. Kawasaki
Metal–insulator transitions in dimensionality controlled LaxSr1−xVO3 films
APL Materials
title Metal–insulator transitions in dimensionality controlled LaxSr1−xVO3 films
title_full Metal–insulator transitions in dimensionality controlled LaxSr1−xVO3 films
title_fullStr Metal–insulator transitions in dimensionality controlled LaxSr1−xVO3 films
title_full_unstemmed Metal–insulator transitions in dimensionality controlled LaxSr1−xVO3 films
title_short Metal–insulator transitions in dimensionality controlled LaxSr1−xVO3 films
title_sort metal insulator transitions in dimensionality controlled laxsr1 xvo3 films
url http://dx.doi.org/10.1063/5.0122864
work_keys_str_mv AT kstakahashi metalinsulatortransitionsindimensionalitycontrolledlaxsr1xvo3films
AT ytokura metalinsulatortransitionsindimensionalitycontrolledlaxsr1xvo3films
AT mkawasaki metalinsulatortransitionsindimensionalitycontrolledlaxsr1xvo3films