Skyrmion Phase in MnSi Thin Films Grown on Sapphire by a Conventional Sputtering
Abstract Topologically protected chiral skyrmions are an intriguing spin texture that has attracted much attention because of fundamental research and future spintronic applications. MnSi with a non-centrosymmetric structure is a well-known material hosting a skyrmion phase. To date, the preparation...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
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SpringerOpen
2021-01-01
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| Series: | Nanoscale Research Letters |
| Subjects: | |
| Online Access: | https://doi.org/10.1186/s11671-020-03462-2 |
| _version_ | 1797766021131534336 |
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| author | Won-Young Choi Hyun-Woo Bang Seung-Hyun Chun Sunghun Lee Myung-Hwa Jung |
| author_facet | Won-Young Choi Hyun-Woo Bang Seung-Hyun Chun Sunghun Lee Myung-Hwa Jung |
| author_sort | Won-Young Choi |
| collection | DOAJ |
| description | Abstract Topologically protected chiral skyrmions are an intriguing spin texture that has attracted much attention because of fundamental research and future spintronic applications. MnSi with a non-centrosymmetric structure is a well-known material hosting a skyrmion phase. To date, the preparation of MnSi crystals has been investigated by using special instruments with an ultrahigh vacuum chamber. Here, we introduce a facile way to grow MnSi films on a sapphire substrate using a relatively low vacuum environment of conventional magnetron sputtering. Although the as-grown MnSi films have a polycrystalline nature, a stable skyrmion phase in a broad range of temperatures and magnetic fields is observed via magnetotransport properties including phenomenological scaling analysis of the Hall resistivity contribution. Our findings provide not only a general way to prepare the materials possessing skyrmion phases but also insight into further research to stimulate more degrees of freedom in our inquisitiveness. |
| first_indexed | 2024-03-12T20:19:16Z |
| format | Article |
| id | doaj.art-444871c958e247629f8747c01874eaf2 |
| institution | Directory Open Access Journal |
| issn | 1556-276X |
| language | English |
| last_indexed | 2024-03-12T20:19:16Z |
| publishDate | 2021-01-01 |
| publisher | SpringerOpen |
| record_format | Article |
| series | Nanoscale Research Letters |
| spelling | doaj.art-444871c958e247629f8747c01874eaf22023-08-02T01:03:23ZengSpringerOpenNanoscale Research Letters1556-276X2021-01-011611710.1186/s11671-020-03462-2Skyrmion Phase in MnSi Thin Films Grown on Sapphire by a Conventional SputteringWon-Young Choi0Hyun-Woo Bang1Seung-Hyun Chun2Sunghun Lee3Myung-Hwa Jung4Department of Physics, Sogang UniversityDepartment of Physics, Sogang UniversityDepartment of Physics, Sejong UniversityDepartment of Physics, Sejong UniversityDepartment of Physics, Sogang UniversityAbstract Topologically protected chiral skyrmions are an intriguing spin texture that has attracted much attention because of fundamental research and future spintronic applications. MnSi with a non-centrosymmetric structure is a well-known material hosting a skyrmion phase. To date, the preparation of MnSi crystals has been investigated by using special instruments with an ultrahigh vacuum chamber. Here, we introduce a facile way to grow MnSi films on a sapphire substrate using a relatively low vacuum environment of conventional magnetron sputtering. Although the as-grown MnSi films have a polycrystalline nature, a stable skyrmion phase in a broad range of temperatures and magnetic fields is observed via magnetotransport properties including phenomenological scaling analysis of the Hall resistivity contribution. Our findings provide not only a general way to prepare the materials possessing skyrmion phases but also insight into further research to stimulate more degrees of freedom in our inquisitiveness.https://doi.org/10.1186/s11671-020-03462-2MnSiSputteringPolycrystalSkyrmionTopological Hall effect |
| spellingShingle | Won-Young Choi Hyun-Woo Bang Seung-Hyun Chun Sunghun Lee Myung-Hwa Jung Skyrmion Phase in MnSi Thin Films Grown on Sapphire by a Conventional Sputtering Nanoscale Research Letters MnSi Sputtering Polycrystal Skyrmion Topological Hall effect |
| title | Skyrmion Phase in MnSi Thin Films Grown on Sapphire by a Conventional Sputtering |
| title_full | Skyrmion Phase in MnSi Thin Films Grown on Sapphire by a Conventional Sputtering |
| title_fullStr | Skyrmion Phase in MnSi Thin Films Grown on Sapphire by a Conventional Sputtering |
| title_full_unstemmed | Skyrmion Phase in MnSi Thin Films Grown on Sapphire by a Conventional Sputtering |
| title_short | Skyrmion Phase in MnSi Thin Films Grown on Sapphire by a Conventional Sputtering |
| title_sort | skyrmion phase in mnsi thin films grown on sapphire by a conventional sputtering |
| topic | MnSi Sputtering Polycrystal Skyrmion Topological Hall effect |
| url | https://doi.org/10.1186/s11671-020-03462-2 |
| work_keys_str_mv | AT wonyoungchoi skyrmionphaseinmnsithinfilmsgrownonsapphirebyaconventionalsputtering AT hyunwoobang skyrmionphaseinmnsithinfilmsgrownonsapphirebyaconventionalsputtering AT seunghyunchun skyrmionphaseinmnsithinfilmsgrownonsapphirebyaconventionalsputtering AT sunghunlee skyrmionphaseinmnsithinfilmsgrownonsapphirebyaconventionalsputtering AT myunghwajung skyrmionphaseinmnsithinfilmsgrownonsapphirebyaconventionalsputtering |