Use of Optical Emission Spectroscopy Data for Fault Detection of Mass Flow Controller in Plasma Etch Equipment
To minimize wafer yield losses by misprocessing during semiconductor manufacturing, faster and more accurate fault detection during the plasma process are desired to increase production yields. Process faults can be caused by abnormal equipment conditions, and the performance drifts of the parts or...
| Main Authors: | , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2022-01-01
|
| Series: | Electronics |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2079-9292/11/2/253 |