Composition Dependence Structural and Optical Properties of Silicon Germanium (Si<sub>χ</sub>Ge<sub>1−χ</sub>) Thin Films

This study investigates the structural and optical characteristics of Silicon Germanium (SiGe) thin films with varying compositions and annealing temperatures for potential use in electronic and optoelectronic devices. Si<sub>0.8</sub>Ge<sub>0.2</sub> and Si<sub>0.9<...

Full description

Bibliographic Details
Main Authors: Syafiqa Nasir, Fuei Pien Chee, Bablu Kumar Ghosh, Muhammad Izzuddin Rumaling, Rosfayanti Rasmidi, Mivolil Duinong, Floressy Juhim
Format: Article
Language:English
Published: MDPI AG 2023-05-01
Series:Crystals
Subjects:
Online Access:https://www.mdpi.com/2073-4352/13/5/791
_version_ 1797600539733655552
author Syafiqa Nasir
Fuei Pien Chee
Bablu Kumar Ghosh
Muhammad Izzuddin Rumaling
Rosfayanti Rasmidi
Mivolil Duinong
Floressy Juhim
author_facet Syafiqa Nasir
Fuei Pien Chee
Bablu Kumar Ghosh
Muhammad Izzuddin Rumaling
Rosfayanti Rasmidi
Mivolil Duinong
Floressy Juhim
author_sort Syafiqa Nasir
collection DOAJ
description This study investigates the structural and optical characteristics of Silicon Germanium (SiGe) thin films with varying compositions and annealing temperatures for potential use in electronic and optoelectronic devices. Si<sub>0.8</sub>Ge<sub>0.2</sub> and Si<sub>0.9</sub>Ge<sub>0.1</sub> films were deposited onto a high-temperature quartz substrate and annealed at 600 °C, 700 °C, and 800 °C before being evaluated using an X-Ray Diffractometer (XRD), Atomic Force Microscopy (AFM), and a UV-Vis Spectrometer for structural and optical properties. The results show that increasing the annealing temperature results in an increase in crystalline size for both compositions. The transmittance for Si<sub>0.8</sub>Ge<sub>0.2</sub> decreases slightly with increasing temperature, while Si<sub>0.9</sub>Ge<sub>0.1</sub> remains constant. The optical band gap for Si<sub>0.9</sub>Ge<sub>0.1</sub> thin film is 5.43 eV at 800 °C, while Si<sub>0.8</sub>Ge<sub>0.2</sub> thin film is 5.6 eV at the same annealing temperature. XRD data and surface analysis reveal significant differences between the band edges of SiGe nano-structure materials and bulk crystals. However, the possibility of a SiGe nano-crystal large band gap requires further investigation based on our study and related research works.
first_indexed 2024-03-11T03:49:34Z
format Article
id doaj.art-450404cdef2c40e795ee02ee2ed8aece
institution Directory Open Access Journal
issn 2073-4352
language English
last_indexed 2024-03-11T03:49:34Z
publishDate 2023-05-01
publisher MDPI AG
record_format Article
series Crystals
spelling doaj.art-450404cdef2c40e795ee02ee2ed8aece2023-11-18T00:59:58ZengMDPI AGCrystals2073-43522023-05-0113579110.3390/cryst13050791Composition Dependence Structural and Optical Properties of Silicon Germanium (Si<sub>χ</sub>Ge<sub>1−χ</sub>) Thin FilmsSyafiqa Nasir0Fuei Pien Chee1Bablu Kumar Ghosh2Muhammad Izzuddin Rumaling3Rosfayanti Rasmidi4Mivolil Duinong5Floressy Juhim6Faculty of Engineering, Universiti Malaysia Sabah, Kota Kinabalu 88400, Sabah, MalaysiaFaculty of Science and Natural Resources, Kota Kinabalu 88400, Sabah, MalaysiaFaculty of Engineering, Universiti Malaysia Sabah, Kota Kinabalu 88400, Sabah, MalaysiaFaculty of Science and Natural Resources, Kota Kinabalu 88400, Sabah, MalaysiaFaculty of Applied Science, Universiti Teknologi MARA Sabah Branch, Kota Kinabalu 88400, Sabah, MalaysiaFaculty of Science and Natural Resources, Kota Kinabalu 88400, Sabah, MalaysiaFaculty of Science and Natural Resources, Kota Kinabalu 88400, Sabah, MalaysiaThis study investigates the structural and optical characteristics of Silicon Germanium (SiGe) thin films with varying compositions and annealing temperatures for potential use in electronic and optoelectronic devices. Si<sub>0.8</sub>Ge<sub>0.2</sub> and Si<sub>0.9</sub>Ge<sub>0.1</sub> films were deposited onto a high-temperature quartz substrate and annealed at 600 °C, 700 °C, and 800 °C before being evaluated using an X-Ray Diffractometer (XRD), Atomic Force Microscopy (AFM), and a UV-Vis Spectrometer for structural and optical properties. The results show that increasing the annealing temperature results in an increase in crystalline size for both compositions. The transmittance for Si<sub>0.8</sub>Ge<sub>0.2</sub> decreases slightly with increasing temperature, while Si<sub>0.9</sub>Ge<sub>0.1</sub> remains constant. The optical band gap for Si<sub>0.9</sub>Ge<sub>0.1</sub> thin film is 5.43 eV at 800 °C, while Si<sub>0.8</sub>Ge<sub>0.2</sub> thin film is 5.6 eV at the same annealing temperature. XRD data and surface analysis reveal significant differences between the band edges of SiGe nano-structure materials and bulk crystals. However, the possibility of a SiGe nano-crystal large band gap requires further investigation based on our study and related research works.https://www.mdpi.com/2073-4352/13/5/791SiGethin filmnano-crystalXRDopto-electronicalloy
spellingShingle Syafiqa Nasir
Fuei Pien Chee
Bablu Kumar Ghosh
Muhammad Izzuddin Rumaling
Rosfayanti Rasmidi
Mivolil Duinong
Floressy Juhim
Composition Dependence Structural and Optical Properties of Silicon Germanium (Si<sub>χ</sub>Ge<sub>1−χ</sub>) Thin Films
Crystals
SiGe
thin film
nano-crystal
XRD
opto-electronic
alloy
title Composition Dependence Structural and Optical Properties of Silicon Germanium (Si<sub>χ</sub>Ge<sub>1−χ</sub>) Thin Films
title_full Composition Dependence Structural and Optical Properties of Silicon Germanium (Si<sub>χ</sub>Ge<sub>1−χ</sub>) Thin Films
title_fullStr Composition Dependence Structural and Optical Properties of Silicon Germanium (Si<sub>χ</sub>Ge<sub>1−χ</sub>) Thin Films
title_full_unstemmed Composition Dependence Structural and Optical Properties of Silicon Germanium (Si<sub>χ</sub>Ge<sub>1−χ</sub>) Thin Films
title_short Composition Dependence Structural and Optical Properties of Silicon Germanium (Si<sub>χ</sub>Ge<sub>1−χ</sub>) Thin Films
title_sort composition dependence structural and optical properties of silicon germanium si sub χ sub ge sub 1 χ sub thin films
topic SiGe
thin film
nano-crystal
XRD
opto-electronic
alloy
url https://www.mdpi.com/2073-4352/13/5/791
work_keys_str_mv AT syafiqanasir compositiondependencestructuralandopticalpropertiesofsilicongermaniumsisubchsubgesub1chsubthinfilms
AT fueipienchee compositiondependencestructuralandopticalpropertiesofsilicongermaniumsisubchsubgesub1chsubthinfilms
AT bablukumarghosh compositiondependencestructuralandopticalpropertiesofsilicongermaniumsisubchsubgesub1chsubthinfilms
AT muhammadizzuddinrumaling compositiondependencestructuralandopticalpropertiesofsilicongermaniumsisubchsubgesub1chsubthinfilms
AT rosfayantirasmidi compositiondependencestructuralandopticalpropertiesofsilicongermaniumsisubchsubgesub1chsubthinfilms
AT mivolilduinong compositiondependencestructuralandopticalpropertiesofsilicongermaniumsisubchsubgesub1chsubthinfilms
AT floressyjuhim compositiondependencestructuralandopticalpropertiesofsilicongermaniumsisubchsubgesub1chsubthinfilms