Synthesis and characterization of ZnO thin film by low cost modified SILAR technique

The ZnO thin film is prepared on Fluorine Tin Oxide (FTO) coated glass substrate by using SILAR deposition technique containing ZnSO<sub>4</sub>.7H<sub>2</sub>O and NaOH as precursor solution with 150 deeping cycles at 70 °C temperature. Nanocrystalline diamond like ZnO thin...

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Main Authors: Haridas D. Dhaygude, Surendra K. Shinde, Ninad B. Velhal, G.M. Lohar, Vijay J. Fulari
Format: Article
Language:English
Published: AIMS Press 2016-03-01
Series:AIMS Materials Science
Subjects:
Online Access:http://www.aimspress.com/Materials/article/689/fulltext.html
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author Haridas D. Dhaygude
Surendra K. Shinde
Ninad B. Velhal
G.M. Lohar
Vijay J. Fulari
author_facet Haridas D. Dhaygude
Surendra K. Shinde
Ninad B. Velhal
G.M. Lohar
Vijay J. Fulari
author_sort Haridas D. Dhaygude
collection DOAJ
description The ZnO thin film is prepared on Fluorine Tin Oxide (FTO) coated glass substrate by using SILAR deposition technique containing ZnSO<sub>4</sub>.7H<sub>2</sub>O and NaOH as precursor solution with 150 deeping cycles at 70 °C temperature. Nanocrystalline diamond like ZnO thin film is characterized by different characterization techniques such as X-ray diffraction (XRD), Fourier transform (FT) Raman spectrometer, Field Emission Scanning Electron Microscopy (FE-SEM) with Energy dispersive X-Ray Analysis (EDAX), optical absorption, surface wettability and photoelectrochemical cell performance measurement. The X-ray diffraction analysis shows that the ZnO thin film is polycrystalline in nature having hexagonal crystal structure. The FT-Raman scattering exhibits a sharp and strong mode at 383 cm<sup>−1</sup><sup> </sup>which confirms hexagonal ZnO nanostructure. The surface morphology study reveals that deposited ZnO film consists of nanocrystalline diamond like morphology all over the substrate. The synthesized thin film exhibited absorption wavelength around 309 nm. Optical study predicted the direct band gap and band gap energy of this film is found to be 3.66 eV. The photoelectrochemical cell (PEC) parameter measurement study shows that ZnO sample confirmed the highest values of, short circuit current&nbsp;(I<sub>sc</sub> - 629 mAcm<sup>−2</sup>), open circuit voltage (V<sub>oc</sub> - 878 mV), fill factor (FF - 0.48), and maximum efficiency (η - 0.89%), respectively.
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spelling doaj.art-4529342ed8dd4b80a83e78906655e4c52022-12-21T19:27:48ZengAIMS PressAIMS Materials Science2372-04842016-03-013234935610.3934/matersci.2016.2.349matersci-03-00349Synthesis and characterization of ZnO thin film by low cost modified SILAR techniqueHaridas D. Dhaygude0Surendra K. Shinde1Ninad B. Velhal2G.M. Lohar3Vijay J. Fulari4Holography and Material Research Laboratory, Department of Physics, Shivaji University, Kolhapur-416004 (MH), IndiHolography and Material Research Laboratory, Department of Physics, Shivaji University, Kolhapur-416004 (MH), IndiThick and Thin Film Device Laboratory, Department of Physics, Shivaji University, Kolhapur-416004 (MH), IndiHolography and Material Research Laboratory, Department of Physics, Shivaji University, Kolhapur-416004 (MH), IndiHolography and Material Research Laboratory, Department of Physics, Shivaji University, Kolhapur-416004 (MH), IndiThe ZnO thin film is prepared on Fluorine Tin Oxide (FTO) coated glass substrate by using SILAR deposition technique containing ZnSO<sub>4</sub>.7H<sub>2</sub>O and NaOH as precursor solution with 150 deeping cycles at 70 °C temperature. Nanocrystalline diamond like ZnO thin film is characterized by different characterization techniques such as X-ray diffraction (XRD), Fourier transform (FT) Raman spectrometer, Field Emission Scanning Electron Microscopy (FE-SEM) with Energy dispersive X-Ray Analysis (EDAX), optical absorption, surface wettability and photoelectrochemical cell performance measurement. The X-ray diffraction analysis shows that the ZnO thin film is polycrystalline in nature having hexagonal crystal structure. The FT-Raman scattering exhibits a sharp and strong mode at 383 cm<sup>−1</sup><sup> </sup>which confirms hexagonal ZnO nanostructure. The surface morphology study reveals that deposited ZnO film consists of nanocrystalline diamond like morphology all over the substrate. The synthesized thin film exhibited absorption wavelength around 309 nm. Optical study predicted the direct band gap and band gap energy of this film is found to be 3.66 eV. The photoelectrochemical cell (PEC) parameter measurement study shows that ZnO sample confirmed the highest values of, short circuit current&nbsp;(I<sub>sc</sub> - 629 mAcm<sup>−2</sup>), open circuit voltage (V<sub>oc</sub> - 878 mV), fill factor (FF - 0.48), and maximum efficiency (η - 0.89%), respectively.http://www.aimspress.com/Materials/article/689/fulltext.htmlzinc oxide thin filmXRD(FE-SEM)opticalphotoelectrochemical cell
spellingShingle Haridas D. Dhaygude
Surendra K. Shinde
Ninad B. Velhal
G.M. Lohar
Vijay J. Fulari
Synthesis and characterization of ZnO thin film by low cost modified SILAR technique
AIMS Materials Science
zinc oxide thin film
XRD
(FE-SEM)
optical
photoelectrochemical cell
title Synthesis and characterization of ZnO thin film by low cost modified SILAR technique
title_full Synthesis and characterization of ZnO thin film by low cost modified SILAR technique
title_fullStr Synthesis and characterization of ZnO thin film by low cost modified SILAR technique
title_full_unstemmed Synthesis and characterization of ZnO thin film by low cost modified SILAR technique
title_short Synthesis and characterization of ZnO thin film by low cost modified SILAR technique
title_sort synthesis and characterization of zno thin film by low cost modified silar technique
topic zinc oxide thin film
XRD
(FE-SEM)
optical
photoelectrochemical cell
url http://www.aimspress.com/Materials/article/689/fulltext.html
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AT ninadbvelhal synthesisandcharacterizationofznothinfilmbylowcostmodifiedsilartechnique
AT gmlohar synthesisandcharacterizationofznothinfilmbylowcostmodifiedsilartechnique
AT vijayjfulari synthesisandcharacterizationofznothinfilmbylowcostmodifiedsilartechnique