A Magnetic Metal Hard Mask on Silicon Substrate for Direct Patterning Ultra-High-Resolution OLED Displays

With the development of virtual reality/augmented reality (VR/AR) display devices, the conventional fine metal mask is limited by the wet etch process, which no longer meets the demand for high pixels per inch (PPI) displays. We deposited a layer of magnetic metal on the silicon substrate by physica...

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Main Authors: Lin Chen, Xiuxia Wang, Yu Wei, Chenggang Zhou
Format: Article
Language:English
Published: MDPI AG 2022-06-01
Series:Micromachines
Subjects:
Online Access:https://www.mdpi.com/2072-666X/13/7/997
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author Lin Chen
Xiuxia Wang
Yu Wei
Chenggang Zhou
author_facet Lin Chen
Xiuxia Wang
Yu Wei
Chenggang Zhou
author_sort Lin Chen
collection DOAJ
description With the development of virtual reality/augmented reality (VR/AR) display devices, the conventional fine metal mask is limited by the wet etch process, which no longer meets the demand for high pixels per inch (PPI) displays. We deposited a layer of magnetic metal on the silicon substrate by physical vapor deposition (PVD), and then developed a 2-inch, 3175 PPI magnetic metal hard mask on silicon substrate (MMS) through deep silicon etching and other micro-nano processing for patterning Organic Light-Emitting Diodes (OLED) displays, which can achieve smaller pixel size and higher PPI. MMS can not only solve the bottleneck problem of the traditional invar alloy shadow mask with low PPI, but also reduce the bending caused by the deformation of the silicon-based mask due to gravity, so that it achieves high PPI and higher uniformity in OLED displays.
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spelling doaj.art-478bf7b0f7944312bfa4c2afd4b554632023-12-01T22:27:12ZengMDPI AGMicromachines2072-666X2022-06-0113799710.3390/mi13070997A Magnetic Metal Hard Mask on Silicon Substrate for Direct Patterning Ultra-High-Resolution OLED DisplaysLin Chen0Xiuxia Wang1Yu Wei2Chenggang Zhou3Center for Micro and Nanoscale Research and Fabrication, Hefei National Laboratory for Physical Science at Microscale, University of Science and Technology of China, Hefei 230026, ChinaCenter for Micro and Nanoscale Research and Fabrication, Hefei National Laboratory for Physical Science at Microscale, University of Science and Technology of China, Hefei 230026, ChinaCenter for Micro and Nanoscale Research and Fabrication, Hefei National Laboratory for Physical Science at Microscale, University of Science and Technology of China, Hefei 230026, ChinaCenter for Micro and Nanoscale Research and Fabrication, Hefei National Laboratory for Physical Science at Microscale, University of Science and Technology of China, Hefei 230026, ChinaWith the development of virtual reality/augmented reality (VR/AR) display devices, the conventional fine metal mask is limited by the wet etch process, which no longer meets the demand for high pixels per inch (PPI) displays. We deposited a layer of magnetic metal on the silicon substrate by physical vapor deposition (PVD), and then developed a 2-inch, 3175 PPI magnetic metal hard mask on silicon substrate (MMS) through deep silicon etching and other micro-nano processing for patterning Organic Light-Emitting Diodes (OLED) displays, which can achieve smaller pixel size and higher PPI. MMS can not only solve the bottleneck problem of the traditional invar alloy shadow mask with low PPI, but also reduce the bending caused by the deformation of the silicon-based mask due to gravity, so that it achieves high PPI and higher uniformity in OLED displays.https://www.mdpi.com/2072-666X/13/7/997shadow maskmagnetic metal hard mask on silicon substratehigh PPIhigh uniform patternOLED displays
spellingShingle Lin Chen
Xiuxia Wang
Yu Wei
Chenggang Zhou
A Magnetic Metal Hard Mask on Silicon Substrate for Direct Patterning Ultra-High-Resolution OLED Displays
Micromachines
shadow mask
magnetic metal hard mask on silicon substrate
high PPI
high uniform pattern
OLED displays
title A Magnetic Metal Hard Mask on Silicon Substrate for Direct Patterning Ultra-High-Resolution OLED Displays
title_full A Magnetic Metal Hard Mask on Silicon Substrate for Direct Patterning Ultra-High-Resolution OLED Displays
title_fullStr A Magnetic Metal Hard Mask on Silicon Substrate for Direct Patterning Ultra-High-Resolution OLED Displays
title_full_unstemmed A Magnetic Metal Hard Mask on Silicon Substrate for Direct Patterning Ultra-High-Resolution OLED Displays
title_short A Magnetic Metal Hard Mask on Silicon Substrate for Direct Patterning Ultra-High-Resolution OLED Displays
title_sort magnetic metal hard mask on silicon substrate for direct patterning ultra high resolution oled displays
topic shadow mask
magnetic metal hard mask on silicon substrate
high PPI
high uniform pattern
OLED displays
url https://www.mdpi.com/2072-666X/13/7/997
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