Fabrication of Modified Random Phase Masks with Phase Modulation Elements Exhibiting Gaussian Profiles Using Molecular Migration under Photopolymerization

Random phase masks are important technical elements for realizing holographic memory systems that enable high density recording. However, the broadly distributed Fourier spectrum often presents a problem because wide recording spots result in reduced total storage capacity for a recording medium. In...

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Main Authors: Akira Emoto, Junya Honda, Kou Suzuki, Takumi Kimoto, Takashi Fukuda
Format: Article
Language:English
Published: MDPI AG 2019-06-01
Series:Photonics
Subjects:
Online Access:https://www.mdpi.com/2304-6732/6/2/62
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author Akira Emoto
Junya Honda
Kou Suzuki
Takumi Kimoto
Takashi Fukuda
author_facet Akira Emoto
Junya Honda
Kou Suzuki
Takumi Kimoto
Takashi Fukuda
author_sort Akira Emoto
collection DOAJ
description Random phase masks are important technical elements for realizing holographic memory systems that enable high density recording. However, the broadly distributed Fourier spectrum often presents a problem because wide recording spots result in reduced total storage capacity for a recording medium. In the present study, we propose modified random phase masks with phase modulation elements exhibiting Gaussian profiles to suppress the spread of the recording spot and keep it in a narrow area, based on the reduction of the high-frequency components in a random phase pattern. We confirm the effectiveness of the proposed random phase mask using simulations of a computer-generated binary hologram. However, issues still remain in terms of the fabrication of random phase masks with Gaussian profiles. Therefore, we evaluate the feasibility of fabricating the proposed random phase mask using molecular diffusion under photopolymerization. The results confirm the feasibility of this approach over a relatively wide area for actual fabrication.
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spelling doaj.art-47b605b622f549e29c830936f0c7b5ef2022-12-21T19:31:30ZengMDPI AGPhotonics2304-67322019-06-01626210.3390/photonics6020062photonics6020062Fabrication of Modified Random Phase Masks with Phase Modulation Elements Exhibiting Gaussian Profiles Using Molecular Migration under PhotopolymerizationAkira Emoto0Junya Honda1Kou Suzuki2Takumi Kimoto3Takashi Fukuda4Graduate School of Science and Engineering, Doshisha University, 1-3 Tatara-miyakodani, Kyotanabe, Kyoto 610-0321, JapanGraduate School of Science and Engineering, Doshisha University, 1-3 Tatara-miyakodani, Kyotanabe, Kyoto 610-0321, JapanGraduate School of Science and Engineering, Doshisha University, 1-3 Tatara-miyakodani, Kyotanabe, Kyoto 610-0321, JapanGraduate School of Science and Engineering, Doshisha University, 1-3 Tatara-miyakodani, Kyotanabe, Kyoto 610-0321, JapanNational Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi Tsukuba, Ibaraki 305-8565, JapanRandom phase masks are important technical elements for realizing holographic memory systems that enable high density recording. However, the broadly distributed Fourier spectrum often presents a problem because wide recording spots result in reduced total storage capacity for a recording medium. In the present study, we propose modified random phase masks with phase modulation elements exhibiting Gaussian profiles to suppress the spread of the recording spot and keep it in a narrow area, based on the reduction of the high-frequency components in a random phase pattern. We confirm the effectiveness of the proposed random phase mask using simulations of a computer-generated binary hologram. However, issues still remain in terms of the fabrication of random phase masks with Gaussian profiles. Therefore, we evaluate the feasibility of fabricating the proposed random phase mask using molecular diffusion under photopolymerization. The results confirm the feasibility of this approach over a relatively wide area for actual fabrication.https://www.mdpi.com/2304-6732/6/2/62holographic memoryrandom phase maskphotopolymermolecular diffusion
spellingShingle Akira Emoto
Junya Honda
Kou Suzuki
Takumi Kimoto
Takashi Fukuda
Fabrication of Modified Random Phase Masks with Phase Modulation Elements Exhibiting Gaussian Profiles Using Molecular Migration under Photopolymerization
Photonics
holographic memory
random phase mask
photopolymer
molecular diffusion
title Fabrication of Modified Random Phase Masks with Phase Modulation Elements Exhibiting Gaussian Profiles Using Molecular Migration under Photopolymerization
title_full Fabrication of Modified Random Phase Masks with Phase Modulation Elements Exhibiting Gaussian Profiles Using Molecular Migration under Photopolymerization
title_fullStr Fabrication of Modified Random Phase Masks with Phase Modulation Elements Exhibiting Gaussian Profiles Using Molecular Migration under Photopolymerization
title_full_unstemmed Fabrication of Modified Random Phase Masks with Phase Modulation Elements Exhibiting Gaussian Profiles Using Molecular Migration under Photopolymerization
title_short Fabrication of Modified Random Phase Masks with Phase Modulation Elements Exhibiting Gaussian Profiles Using Molecular Migration under Photopolymerization
title_sort fabrication of modified random phase masks with phase modulation elements exhibiting gaussian profiles using molecular migration under photopolymerization
topic holographic memory
random phase mask
photopolymer
molecular diffusion
url https://www.mdpi.com/2304-6732/6/2/62
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