Fabrication of Modified Random Phase Masks with Phase Modulation Elements Exhibiting Gaussian Profiles Using Molecular Migration under Photopolymerization
Random phase masks are important technical elements for realizing holographic memory systems that enable high density recording. However, the broadly distributed Fourier spectrum often presents a problem because wide recording spots result in reduced total storage capacity for a recording medium. In...
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MDPI AG
2019-06-01
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Series: | Photonics |
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Online Access: | https://www.mdpi.com/2304-6732/6/2/62 |
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author | Akira Emoto Junya Honda Kou Suzuki Takumi Kimoto Takashi Fukuda |
author_facet | Akira Emoto Junya Honda Kou Suzuki Takumi Kimoto Takashi Fukuda |
author_sort | Akira Emoto |
collection | DOAJ |
description | Random phase masks are important technical elements for realizing holographic memory systems that enable high density recording. However, the broadly distributed Fourier spectrum often presents a problem because wide recording spots result in reduced total storage capacity for a recording medium. In the present study, we propose modified random phase masks with phase modulation elements exhibiting Gaussian profiles to suppress the spread of the recording spot and keep it in a narrow area, based on the reduction of the high-frequency components in a random phase pattern. We confirm the effectiveness of the proposed random phase mask using simulations of a computer-generated binary hologram. However, issues still remain in terms of the fabrication of random phase masks with Gaussian profiles. Therefore, we evaluate the feasibility of fabricating the proposed random phase mask using molecular diffusion under photopolymerization. The results confirm the feasibility of this approach over a relatively wide area for actual fabrication. |
first_indexed | 2024-12-20T17:27:11Z |
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id | doaj.art-47b605b622f549e29c830936f0c7b5ef |
institution | Directory Open Access Journal |
issn | 2304-6732 |
language | English |
last_indexed | 2024-12-20T17:27:11Z |
publishDate | 2019-06-01 |
publisher | MDPI AG |
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series | Photonics |
spelling | doaj.art-47b605b622f549e29c830936f0c7b5ef2022-12-21T19:31:30ZengMDPI AGPhotonics2304-67322019-06-01626210.3390/photonics6020062photonics6020062Fabrication of Modified Random Phase Masks with Phase Modulation Elements Exhibiting Gaussian Profiles Using Molecular Migration under PhotopolymerizationAkira Emoto0Junya Honda1Kou Suzuki2Takumi Kimoto3Takashi Fukuda4Graduate School of Science and Engineering, Doshisha University, 1-3 Tatara-miyakodani, Kyotanabe, Kyoto 610-0321, JapanGraduate School of Science and Engineering, Doshisha University, 1-3 Tatara-miyakodani, Kyotanabe, Kyoto 610-0321, JapanGraduate School of Science and Engineering, Doshisha University, 1-3 Tatara-miyakodani, Kyotanabe, Kyoto 610-0321, JapanGraduate School of Science and Engineering, Doshisha University, 1-3 Tatara-miyakodani, Kyotanabe, Kyoto 610-0321, JapanNational Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi Tsukuba, Ibaraki 305-8565, JapanRandom phase masks are important technical elements for realizing holographic memory systems that enable high density recording. However, the broadly distributed Fourier spectrum often presents a problem because wide recording spots result in reduced total storage capacity for a recording medium. In the present study, we propose modified random phase masks with phase modulation elements exhibiting Gaussian profiles to suppress the spread of the recording spot and keep it in a narrow area, based on the reduction of the high-frequency components in a random phase pattern. We confirm the effectiveness of the proposed random phase mask using simulations of a computer-generated binary hologram. However, issues still remain in terms of the fabrication of random phase masks with Gaussian profiles. Therefore, we evaluate the feasibility of fabricating the proposed random phase mask using molecular diffusion under photopolymerization. The results confirm the feasibility of this approach over a relatively wide area for actual fabrication.https://www.mdpi.com/2304-6732/6/2/62holographic memoryrandom phase maskphotopolymermolecular diffusion |
spellingShingle | Akira Emoto Junya Honda Kou Suzuki Takumi Kimoto Takashi Fukuda Fabrication of Modified Random Phase Masks with Phase Modulation Elements Exhibiting Gaussian Profiles Using Molecular Migration under Photopolymerization Photonics holographic memory random phase mask photopolymer molecular diffusion |
title | Fabrication of Modified Random Phase Masks with Phase Modulation Elements Exhibiting Gaussian Profiles Using Molecular Migration under Photopolymerization |
title_full | Fabrication of Modified Random Phase Masks with Phase Modulation Elements Exhibiting Gaussian Profiles Using Molecular Migration under Photopolymerization |
title_fullStr | Fabrication of Modified Random Phase Masks with Phase Modulation Elements Exhibiting Gaussian Profiles Using Molecular Migration under Photopolymerization |
title_full_unstemmed | Fabrication of Modified Random Phase Masks with Phase Modulation Elements Exhibiting Gaussian Profiles Using Molecular Migration under Photopolymerization |
title_short | Fabrication of Modified Random Phase Masks with Phase Modulation Elements Exhibiting Gaussian Profiles Using Molecular Migration under Photopolymerization |
title_sort | fabrication of modified random phase masks with phase modulation elements exhibiting gaussian profiles using molecular migration under photopolymerization |
topic | holographic memory random phase mask photopolymer molecular diffusion |
url | https://www.mdpi.com/2304-6732/6/2/62 |
work_keys_str_mv | AT akiraemoto fabricationofmodifiedrandomphasemaskswithphasemodulationelementsexhibitinggaussianprofilesusingmolecularmigrationunderphotopolymerization AT junyahonda fabricationofmodifiedrandomphasemaskswithphasemodulationelementsexhibitinggaussianprofilesusingmolecularmigrationunderphotopolymerization AT kousuzuki fabricationofmodifiedrandomphasemaskswithphasemodulationelementsexhibitinggaussianprofilesusingmolecularmigrationunderphotopolymerization AT takumikimoto fabricationofmodifiedrandomphasemaskswithphasemodulationelementsexhibitinggaussianprofilesusingmolecularmigrationunderphotopolymerization AT takashifukuda fabricationofmodifiedrandomphasemaskswithphasemodulationelementsexhibitinggaussianprofilesusingmolecularmigrationunderphotopolymerization |