Fabrication of Modified Random Phase Masks with Phase Modulation Elements Exhibiting Gaussian Profiles Using Molecular Migration under Photopolymerization

Fabrication of Modified Random Phase Masks with Phase Modulation Elements Exhibiting Gaussian Profiles Using Molecular Migration under Photopolymerization

Random phase masks are important technical elements for realizing holographic memory systems that enable high density recording. However, the broadly distributed Fourier spectrum often presents a problem because wide recording spots result in reduced total storage capacity for a recording medium. In...

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Bibliographic Details
Main Authors: Akira Emoto, Junya Honda, Kou Suzuki, Takumi Kimoto, Takashi Fukuda
Format: Article
Language:English
Published: MDPI AG 2019-06-01
Series:Photonics
Subjects:
holographic memory
random phase mask
photopolymer
molecular diffusion
Online Access:https://www.mdpi.com/2304-6732/6/2/62

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