Gas Velosity and Mass Flowrate Scaling Modeling in Microelectronics’ Thermal Control Systems

<em>In the present research we investigate pressure driven flow in the transition and free-molecular flow regimes with the objective of developing unified flow models for microchannels. These models are based on a velocity scaling law, which is valid for a wide range of Knudsen number. Simple...

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Bibliographic Details
Main Authors: B. V. Kosoy, Y. Utaka
Format: Article
Language:English
Published: Odesa National University of Technology 2017-12-01
Series:Holodilʹnaâ Tehnika i Tehnologiâ
Subjects:
Online Access:http://journals.gsjp.eu/index.php/reftech/article/view/923
Description
Summary:<em>In the present research we investigate pressure driven flow in the transition and free-molecular flow regimes with the objective of developing unified flow models for microchannels. These models are based on a velocity scaling law, which is valid for a wide range of Knudsen number. Simple slip-based descriptions of flowrate in microchannels are corrected for effects in the transition and free-molecular flow regimes with the introduction of a rarefaction factor. The resulting models can predict the velocity distribution, mass flowrate, pressure and shear stress distribution in rectangular microchannels in the entire Knudsen flow regime.</em>
ISSN:0453-8307
2409-6792