Gas Velosity and Mass Flowrate Scaling Modeling in Microelectronics’ Thermal Control Systems
<em>In the present research we investigate pressure driven flow in the transition and free-molecular flow regimes with the objective of developing unified flow models for microchannels. These models are based on a velocity scaling law, which is valid for a wide range of Knudsen number. Simple...
Main Authors: | , |
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Format: | Article |
Language: | English |
Published: |
Odesa National University of Technology
2017-12-01
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Series: | Holodilʹnaâ Tehnika i Tehnologiâ |
Subjects: | |
Online Access: | http://journals.gsjp.eu/index.php/reftech/article/view/923 |
Summary: | <em>In the present research we investigate pressure driven flow in the transition and free-molecular flow regimes with the objective of developing unified flow models for microchannels. These models are based on a velocity scaling law, which is valid for a wide range of Knudsen number. Simple slip-based descriptions of flowrate in microchannels are corrected for effects in the transition and free-molecular flow regimes with the introduction of a rarefaction factor. The resulting models can predict the velocity distribution, mass flowrate, pressure and shear stress distribution in rectangular microchannels in the entire Knudsen flow regime.</em> |
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ISSN: | 0453-8307 2409-6792 |