In Vitro Study of Zirconia Surface Modification for Dental Implants by Atomic Layer Deposition
Zirconia is a promising material for dental implants; however, an appropriate surface modification procedure has not yet been identified. Atomic layer deposition (ALD) is a nanotechnology that deposits thin films of metal oxides or metals on materials. The aim of this study was to deposit thin films...
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MDPI AG
2023-06-01
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| Series: | International Journal of Molecular Sciences |
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| Online Access: | https://www.mdpi.com/1422-0067/24/12/10101 |
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| author | Tatsuhide Hayashi Masaki Asakura Shin Koie Shogo Hasegawa Akimichi Mieki Koki Aimu Tatsushi Kawai |
| author_facet | Tatsuhide Hayashi Masaki Asakura Shin Koie Shogo Hasegawa Akimichi Mieki Koki Aimu Tatsushi Kawai |
| author_sort | Tatsuhide Hayashi |
| collection | DOAJ |
| description | Zirconia is a promising material for dental implants; however, an appropriate surface modification procedure has not yet been identified. Atomic layer deposition (ALD) is a nanotechnology that deposits thin films of metal oxides or metals on materials. The aim of this study was to deposit thin films of titanium dioxide (TiO<sub>2</sub>), aluminum oxide (Al<sub>2</sub>O<sub>3</sub>), silicon dioxide (SiO<sub>2</sub>), and zinc oxide (ZnO) on zirconia disks (ZR-Ti, ZR-Al, ZR-Si, and ZR-Zn, respectively) using ALD and evaluate the cell proliferation abilities of mouse fibroblasts (L929) and mouse osteoblastic cells (MC3T3-E1) on each sample. Zirconia disks (ZR; diameter 10 mm) were fabricated using a computer-aided design/computer-aided manufacturing system. Following the ALD of TiO<sub>2</sub>, Al<sub>2</sub>O<sub>3</sub>, SiO<sub>2</sub>, or ZnO thin film, the thin-film thickness, elemental distribution, contact angle, adhesion strength, and elemental elution were determined. The L929 and MC3T3-E1 cell proliferation and morphologies on each sample were observed on days 1, 3, and 5 (L929) and days 1, 4, and 7 (MC3T3-E1). The ZR-Ti, ZR-Al, ZR-Si, and ZR-Zn thin-film thicknesses were 41.97, 42.36, 62.50, and 61.11 nm, respectively, and their average adhesion strengths were 163.5, 140.9, 157.3, and 161.6 mN, respectively. The contact angle on ZR-Si was significantly lower than that on all the other specimens. The eluted Zr, Ti, and Al amounts were below the detection limits, whereas the total Si and Zn elution amounts over two weeks were 0.019 and 0.695 ppm, respectively. For both L929 and MC3T3-E1, the cell numbers increased over time on ZR, ZR-Ti, ZR-Al, and ZR-Si. Particularly, cell proliferation in ZR-Ti exceeded that in the other samples. These results suggest that ALD application to zirconia, particularly for TiO<sub>2</sub> deposition, could be a new surface modification procedure for zirconia dental implants. |
| first_indexed | 2024-03-11T02:21:15Z |
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| spelling | doaj.art-497828d5d3324a81abdb1cf142a1749d2023-11-18T10:48:39ZengMDPI AGInternational Journal of Molecular Sciences1661-65961422-00672023-06-0124121010110.3390/ijms241210101In Vitro Study of Zirconia Surface Modification for Dental Implants by Atomic Layer DepositionTatsuhide Hayashi0Masaki Asakura1Shin Koie2Shogo Hasegawa3Akimichi Mieki4Koki Aimu5Tatsushi Kawai6Department of Dental Materials Science, Aichi Gakuin University School of Dentistry, 1-00 Kusumoto-cho, Chikusa-ku, Nagoya 464-8650, JapanDepartment of Dental Materials Science, Aichi Gakuin University School of Dentistry, 1-00 Kusumoto-cho, Chikusa-ku, Nagoya 464-8650, JapanDepartment of Maxillofacial Surgery, Aichi Gakuin University School of Dentistry, 2-11 Suemori-dori, Chikusa-ku, Nagoya 464-8651, JapanDepartment of Maxillofacial Surgery, Aichi Gakuin University School of Dentistry, 2-11 Suemori-dori, Chikusa-ku, Nagoya 464-8651, JapanDepartment of Dental Materials Science, Aichi Gakuin University School of Dentistry, 1-00 Kusumoto-cho, Chikusa-ku, Nagoya 464-8650, JapanDepartment of Dental Materials Science, Aichi Gakuin University School of Dentistry, 1-00 Kusumoto-cho, Chikusa-ku, Nagoya 464-8650, JapanDepartment of Dental Materials Science, Aichi Gakuin University School of Dentistry, 1-00 Kusumoto-cho, Chikusa-ku, Nagoya 464-8650, JapanZirconia is a promising material for dental implants; however, an appropriate surface modification procedure has not yet been identified. Atomic layer deposition (ALD) is a nanotechnology that deposits thin films of metal oxides or metals on materials. The aim of this study was to deposit thin films of titanium dioxide (TiO<sub>2</sub>), aluminum oxide (Al<sub>2</sub>O<sub>3</sub>), silicon dioxide (SiO<sub>2</sub>), and zinc oxide (ZnO) on zirconia disks (ZR-Ti, ZR-Al, ZR-Si, and ZR-Zn, respectively) using ALD and evaluate the cell proliferation abilities of mouse fibroblasts (L929) and mouse osteoblastic cells (MC3T3-E1) on each sample. Zirconia disks (ZR; diameter 10 mm) were fabricated using a computer-aided design/computer-aided manufacturing system. Following the ALD of TiO<sub>2</sub>, Al<sub>2</sub>O<sub>3</sub>, SiO<sub>2</sub>, or ZnO thin film, the thin-film thickness, elemental distribution, contact angle, adhesion strength, and elemental elution were determined. The L929 and MC3T3-E1 cell proliferation and morphologies on each sample were observed on days 1, 3, and 5 (L929) and days 1, 4, and 7 (MC3T3-E1). The ZR-Ti, ZR-Al, ZR-Si, and ZR-Zn thin-film thicknesses were 41.97, 42.36, 62.50, and 61.11 nm, respectively, and their average adhesion strengths were 163.5, 140.9, 157.3, and 161.6 mN, respectively. The contact angle on ZR-Si was significantly lower than that on all the other specimens. The eluted Zr, Ti, and Al amounts were below the detection limits, whereas the total Si and Zn elution amounts over two weeks were 0.019 and 0.695 ppm, respectively. For both L929 and MC3T3-E1, the cell numbers increased over time on ZR, ZR-Ti, ZR-Al, and ZR-Si. Particularly, cell proliferation in ZR-Ti exceeded that in the other samples. These results suggest that ALD application to zirconia, particularly for TiO<sub>2</sub> deposition, could be a new surface modification procedure for zirconia dental implants.https://www.mdpi.com/1422-0067/24/12/10101atomic layer depositionzirconiadental implantssurface modificationcell proliferation |
| spellingShingle | Tatsuhide Hayashi Masaki Asakura Shin Koie Shogo Hasegawa Akimichi Mieki Koki Aimu Tatsushi Kawai In Vitro Study of Zirconia Surface Modification for Dental Implants by Atomic Layer Deposition International Journal of Molecular Sciences atomic layer deposition zirconia dental implants surface modification cell proliferation |
| title | In Vitro Study of Zirconia Surface Modification for Dental Implants by Atomic Layer Deposition |
| title_full | In Vitro Study of Zirconia Surface Modification for Dental Implants by Atomic Layer Deposition |
| title_fullStr | In Vitro Study of Zirconia Surface Modification for Dental Implants by Atomic Layer Deposition |
| title_full_unstemmed | In Vitro Study of Zirconia Surface Modification for Dental Implants by Atomic Layer Deposition |
| title_short | In Vitro Study of Zirconia Surface Modification for Dental Implants by Atomic Layer Deposition |
| title_sort | in vitro study of zirconia surface modification for dental implants by atomic layer deposition |
| topic | atomic layer deposition zirconia dental implants surface modification cell proliferation |
| url | https://www.mdpi.com/1422-0067/24/12/10101 |
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