Ice lithography using tungsten hexacarbonyl
Ice lithography (IL) fabricates 2D and 3D patterns using electron-solid interaction principle. Herein, we report IL patterning of the negative tone metalorganic precursor. The precursor is condensed at 80 K. It is then patterned using a 5–20 keV electron beam. The pattern thickness and surface rough...
| Main Authors: | , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2023-04-01
|
| Series: | Micro and Nano Engineering |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2590007223000011 |
| _version_ | 1797866087243579392 |
|---|---|
| author | Rubaiyet I. Haque Affan Kaysa Waafi Bingdong Chang Anpan Han |
| author_facet | Rubaiyet I. Haque Affan Kaysa Waafi Bingdong Chang Anpan Han |
| author_sort | Rubaiyet I. Haque |
| collection | DOAJ |
| description | Ice lithography (IL) fabricates 2D and 3D patterns using electron-solid interaction principle. Herein, we report IL patterning of the negative tone metalorganic precursor. The precursor is condensed at 80 K. It is then patterned using a 5–20 keV electron beam. The pattern thickness and surface roughness increase with area dose. The line thickness and linewidth also increase with the growing line doses. XPS results show that tungsten is bound to oxygen; metallic and WC bonds are absent, which suggests the IL patterned tungsten hexacarbonyl contains oxidized tungsten embedded in carbon and oxygen matrix. Finally, the IL patterned tungsten hexacarbonyl was investigated as an etch mask for nanofabrication applications. The silicon plasma etching selectivity is 30:1, comparable with commercial photoresists. |
| first_indexed | 2024-04-09T23:18:25Z |
| format | Article |
| id | doaj.art-498977bf8f194c0099d765a10e9f2abe |
| institution | Directory Open Access Journal |
| issn | 2590-0072 |
| language | English |
| last_indexed | 2024-04-09T23:18:25Z |
| publishDate | 2023-04-01 |
| publisher | Elsevier |
| record_format | Article |
| series | Micro and Nano Engineering |
| spelling | doaj.art-498977bf8f194c0099d765a10e9f2abe2023-03-22T04:37:45ZengElsevierMicro and Nano Engineering2590-00722023-04-0118100171Ice lithography using tungsten hexacarbonylRubaiyet I. Haque0Affan Kaysa Waafi1Bingdong Chang2Anpan Han3Department of Mechanical Engineering, Technical University of Denmark, 2800 Kongens Lyngby, Denmark.Department of Mechanical Engineering, Technical University of Denmark, 2800 Kongens Lyngby, Denmark.Department of Mechanical Engineering, Technical University of Denmark, 2800 Kongens Lyngby, Denmark.Corresponding author.; Department of Mechanical Engineering, Technical University of Denmark, 2800 Kongens Lyngby, Denmark.Ice lithography (IL) fabricates 2D and 3D patterns using electron-solid interaction principle. Herein, we report IL patterning of the negative tone metalorganic precursor. The precursor is condensed at 80 K. It is then patterned using a 5–20 keV electron beam. The pattern thickness and surface roughness increase with area dose. The line thickness and linewidth also increase with the growing line doses. XPS results show that tungsten is bound to oxygen; metallic and WC bonds are absent, which suggests the IL patterned tungsten hexacarbonyl contains oxidized tungsten embedded in carbon and oxygen matrix. Finally, the IL patterned tungsten hexacarbonyl was investigated as an etch mask for nanofabrication applications. The silicon plasma etching selectivity is 30:1, comparable with commercial photoresists.http://www.sciencedirect.com/science/article/pii/S2590007223000011Ice lithographyTungsten hexacarbonylElectron beam lithographyNanofabricationOrganic ice |
| spellingShingle | Rubaiyet I. Haque Affan Kaysa Waafi Bingdong Chang Anpan Han Ice lithography using tungsten hexacarbonyl Micro and Nano Engineering Ice lithography Tungsten hexacarbonyl Electron beam lithography Nanofabrication Organic ice |
| title | Ice lithography using tungsten hexacarbonyl |
| title_full | Ice lithography using tungsten hexacarbonyl |
| title_fullStr | Ice lithography using tungsten hexacarbonyl |
| title_full_unstemmed | Ice lithography using tungsten hexacarbonyl |
| title_short | Ice lithography using tungsten hexacarbonyl |
| title_sort | ice lithography using tungsten hexacarbonyl |
| topic | Ice lithography Tungsten hexacarbonyl Electron beam lithography Nanofabrication Organic ice |
| url | http://www.sciencedirect.com/science/article/pii/S2590007223000011 |
| work_keys_str_mv | AT rubaiyetihaque icelithographyusingtungstenhexacarbonyl AT affankaysawaafi icelithographyusingtungstenhexacarbonyl AT bingdongchang icelithographyusingtungstenhexacarbonyl AT anpanhan icelithographyusingtungstenhexacarbonyl |