Nanoimprinted and Anodized Templates for Large-Scale and Low-Cost Nanopatterning
Nanopatterning to fabricate advanced nanostructured materials is a widely employed technology in a broad spectrum of applications going from spintronics and nanoelectronics to nanophotonics. This work reports on an easy route for nanopatterning making use of ordered porous templates with geometries...
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| Format: | Article |
| Language: | English |
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MDPI AG
2021-12-01
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| Series: | Nanomaterials |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2079-4991/11/12/3430 |
| _version_ | 1797501899209965568 |
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| author | David Navas David G. Trabada Manuel Vázquez |
| author_facet | David Navas David G. Trabada Manuel Vázquez |
| author_sort | David Navas |
| collection | DOAJ |
| description | Nanopatterning to fabricate advanced nanostructured materials is a widely employed technology in a broad spectrum of applications going from spintronics and nanoelectronics to nanophotonics. This work reports on an easy route for nanopatterning making use of ordered porous templates with geometries ranging from straight lines to square, triangular or rhombohedral lattices, to be employed for the designed growth of sputtered materials with engineered properties. The procedure is based on large-scale nanoimprinting using patterned low-cost commercial disks, as 1-D grating stamps, followed by a single electrochemical process that allows one to obtain 1-D ordered porous anodic templates. Multiple imprinting steps at different angles enable more complex 2-D patterned templates. Subsequently, sputtering facilitates the growth of ferromagnetic antidot thin films (e.g., from 20 to 100 nm Co thick layers) with designed symmetries. This technique constitutes a non-expensive method for massive mold production and pattern generation avoiding standard lithographical techniques. In addition, it overcomes current challenges of the two-stage electrochemical porous anodic alumina templates: (i) allowing the patterning of large areas with high ordering and/or complex antidot geometries, and (ii) being less-time consuming. |
| first_indexed | 2024-03-10T03:25:15Z |
| format | Article |
| id | doaj.art-4ba577ab37614209affa6aae9221644b |
| institution | Directory Open Access Journal |
| issn | 2079-4991 |
| language | English |
| last_indexed | 2024-03-10T03:25:15Z |
| publishDate | 2021-12-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Nanomaterials |
| spelling | doaj.art-4ba577ab37614209affa6aae9221644b2023-11-23T09:52:30ZengMDPI AGNanomaterials2079-49912021-12-011112343010.3390/nano11123430Nanoimprinted and Anodized Templates for Large-Scale and Low-Cost NanopatterningDavid Navas0David G. Trabada1Manuel Vázquez2Instituto de Ciencia de Materiales de Madrid, ICMM-CSIC, 28049 Madrid, SpainInstituto de Ciencia de Materiales de Madrid, ICMM-CSIC, 28049 Madrid, SpainInstituto de Ciencia de Materiales de Madrid, ICMM-CSIC, 28049 Madrid, SpainNanopatterning to fabricate advanced nanostructured materials is a widely employed technology in a broad spectrum of applications going from spintronics and nanoelectronics to nanophotonics. This work reports on an easy route for nanopatterning making use of ordered porous templates with geometries ranging from straight lines to square, triangular or rhombohedral lattices, to be employed for the designed growth of sputtered materials with engineered properties. The procedure is based on large-scale nanoimprinting using patterned low-cost commercial disks, as 1-D grating stamps, followed by a single electrochemical process that allows one to obtain 1-D ordered porous anodic templates. Multiple imprinting steps at different angles enable more complex 2-D patterned templates. Subsequently, sputtering facilitates the growth of ferromagnetic antidot thin films (e.g., from 20 to 100 nm Co thick layers) with designed symmetries. This technique constitutes a non-expensive method for massive mold production and pattern generation avoiding standard lithographical techniques. In addition, it overcomes current challenges of the two-stage electrochemical porous anodic alumina templates: (i) allowing the patterning of large areas with high ordering and/or complex antidot geometries, and (ii) being less-time consuming.https://www.mdpi.com/2079-4991/11/12/3430large-scale nanopatterningcombined imprint-electrochemical processesporous anodic alumina membranessquare and triangular 2D templatesferromagnetic antidots |
| spellingShingle | David Navas David G. Trabada Manuel Vázquez Nanoimprinted and Anodized Templates for Large-Scale and Low-Cost Nanopatterning Nanomaterials large-scale nanopatterning combined imprint-electrochemical processes porous anodic alumina membranes square and triangular 2D templates ferromagnetic antidots |
| title | Nanoimprinted and Anodized Templates for Large-Scale and Low-Cost Nanopatterning |
| title_full | Nanoimprinted and Anodized Templates for Large-Scale and Low-Cost Nanopatterning |
| title_fullStr | Nanoimprinted and Anodized Templates for Large-Scale and Low-Cost Nanopatterning |
| title_full_unstemmed | Nanoimprinted and Anodized Templates for Large-Scale and Low-Cost Nanopatterning |
| title_short | Nanoimprinted and Anodized Templates for Large-Scale and Low-Cost Nanopatterning |
| title_sort | nanoimprinted and anodized templates for large scale and low cost nanopatterning |
| topic | large-scale nanopatterning combined imprint-electrochemical processes porous anodic alumina membranes square and triangular 2D templates ferromagnetic antidots |
| url | https://www.mdpi.com/2079-4991/11/12/3430 |
| work_keys_str_mv | AT davidnavas nanoimprintedandanodizedtemplatesforlargescaleandlowcostnanopatterning AT davidgtrabada nanoimprintedandanodizedtemplatesforlargescaleandlowcostnanopatterning AT manuelvazquez nanoimprintedandanodizedtemplatesforlargescaleandlowcostnanopatterning |