Engineering high quality graphene superlattices via ion milled ultra-thin etching masks

Engineering high quality graphene superlattices via ion milled ultra-thin etching masks

Focused-ion beam (FIB) lithography enables high-resolution nanopatterning of 2D materials, but usually introduces significant damage. Here, the authors report a FIB-based fabrication technique to obtain high quality graphene superlattices with 18-nm pitch, which exhibit electronic transport properti...

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Bibliographic Details
Main Authors: David Barcons Ruiz, Hanan Herzig Sheinfux, Rebecca Hoffmann, Iacopo Torre, Hitesh Agarwal, Roshan Krishna Kumar, Lorenzo Vistoli, Takashi Taniguchi, Kenji Watanabe, Adrian Bachtold, Frank H. L. Koppens
Format: Article
Language:English
Published: Nature Portfolio 2022-11-01
Series:Nature Communications
Online Access:https://doi.org/10.1038/s41467-022-34734-3

Internet

https://doi.org/10.1038/s41467-022-34734-3

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