Influence of X-ray irradiation on the optical absorption edge and refractive index dispersion in Cu6PS5I-based thin films deposited using magnetron sputtering

Influence of X-ray irradiation on the optical absorption edge and refractive index dispersion in Cu6PS5I-based thin films deposited using magnetron sputtering

Cu6PS5I-based thin films were deposited using non-reactive radio-frequency magnetron sputtering. Structural studies of thin films were performed by scanning electron microscopy, their chemical composition were determined using energy-dispersive X-ray spectroscopy. As-deposited thin films were irradi...

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Bibliographic Details
Main Authors: I.P. Studenyak, M.M. Kutsyk, A.V. Bendak, V.Yu. Izai, P. Kúš, M. Mikula
Format: Article
Language:English
Published: National Academy of Sciences of Ukraine. Institute of Semi conductor physics. 2017-07-01
Series:Semiconductor Physics, Quantum Electronics & Optoelectronics
Subjects:
thin film
magnetron sputtering
X-ray irradiation
optical absorption
Online Access:http://journal-spqeo.org.ua/n2_2017/P246-249abstr.html

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