Electrically induced cancellation and inversion of piezoelectricity in ferroelectric Hf0.5Zr0.5O2
Abstract HfO2-based thin films hold huge promise for integrated devices as they show full compatibility with semiconductor technologies and robust ferroelectric properties at nanometer scale. While their polarization switching behavior has been widely investigated, their electromechanical response r...
Main Authors: | Haidong Lu, Dong-Jik Kim, Hugo Aramberri, Marco Holzer, Pratyush Buragohain, Sangita Dutta, Uwe Schroeder, Veeresh Deshpande, Jorge Íñiguez, Alexei Gruverman, Catherine Dubourdieu |
---|---|
Format: | Article |
Language: | English |
Published: |
Nature Portfolio
2024-01-01
|
Series: | Nature Communications |
Online Access: | https://doi.org/10.1038/s41467-024-44690-9 |
Similar Items
-
Ferroelectricity and ferroelectric resistive switching in sputtered Hf0.5Zr0.5O2 thin films
by: Fan, Zhen, et al.
Published: (2016) -
Investigating the Electromechanical Behavior of Unconventionally Ferroelectric Hf0.5Zr0.5O2‐Based Capacitors Through Operando Nanobeam X‐Ray Diffraction
by: Evgenios Stylianidis, et al.
Published: (2023-06-01) -
Interface-engineered ferroelectricity of epitaxial Hf0.5Zr0.5O2 thin films
by: Shu Shi, et al.
Published: (2023-03-01) -
Programmable ferroelectricity in Hf0.5Zr0.5O2 enabled by oxygen defect engineering
by: Shao, Minghao, et al.
Published: (2024) -
Metastable ferroelectricity driven by depolarization fields in ultrathin Hf0.5Zr0.5O2
by: Nikitas Siannas, et al.
Published: (2022-07-01)