Kinetics of Catalyst-Free and Position-Controlled Low-Pressure Chemical Vapor Deposition Growth of VO<sub>2</sub> Nanowire Arrays on Nanoimprinted Si Substrates

Kinetics of Catalyst-Free and Position-Controlled Low-Pressure Chemical Vapor Deposition Growth of VO<sub>2</sub> Nanowire Arrays on Nanoimprinted Si Substrates

In the present article, the position-controlled and catalytic-free synthesis of vanadium dioxide (VO<sub>2</sub>) nanowires (NWs) grown by the chemical vapor deposition (CVD) on nanoimprinted silicon substrates in the form of nanopillar arrays was analyzed. The NW growth on silicon nanop...

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Bibliographic Details
Main Authors: Sergey V. Mutilin, Lyubov V. Yakovkina, Vladimir A. Seleznev, Victor Ya. Prinz
Format: Article
Language:English
Published: MDPI AG 2022-11-01
Series:Materials
Subjects:
nanowires
vanadium dioxide
selective area
CVD
VO<sub>2</sub>
phase transition
Online Access:https://www.mdpi.com/1996-1944/15/21/7863

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https://www.mdpi.com/1996-1944/15/21/7863

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