Residual stress tuned magnetic properties of thick CoMnP/Cu multilayers

Residual stress tuned magnetic properties of thick CoMnP/Cu multilayers

Electrodeposited hard magnetic thick films have vast applications in the microelectromechanical systems (MEMS). Yet the very large residual stresses (σr) built-up in monolayered thick magnetic films leads to cracks, dimensional changes and deteriorated magnetic properties. Here, we explored quantita...

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Bibliographic Details
Main Authors:	Yu-Shan Chen, Chiao-Chi Lin, Tsung-Shune Chin, Jen-Yuan (James) Chang, Cheng-Kuo Sung
Format:	Article
Language:	English
Published:	AIP Publishing LLC 2022-03-01
Series:	AIP Advances
Online Access:	http://dx.doi.org/10.1063/9.0000319

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