Effect of Annealing on the Surface Hardness of High-Fluence Nitrogen Ion-Implanted Titanium
Commercially pure titanium grade II was kinetically nitrided by implanting nitrogen ions with a fluence in the range of (1–9)·10<sup>17</sup> cm<sup>−2</sup> and ion energy of 90 keV. Post-implantation annealing in the temperature stability range of TiN (up to 600 °C) shows h...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2023-05-01
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| Series: | Materials |
| Subjects: | |
| Online Access: | https://www.mdpi.com/1996-1944/16/10/3837 |
| Summary: | Commercially pure titanium grade II was kinetically nitrided by implanting nitrogen ions with a fluence in the range of (1–9)·10<sup>17</sup> cm<sup>−2</sup> and ion energy of 90 keV. Post-implantation annealing in the temperature stability range of TiN (up to 600 °C) shows hardness degradation for titanium implanted with high fluences above 6·10<sup>17</sup> cm<sup>−2</sup>, leading to nitrogen oversaturation. Temperature-induced redistribution of interstitially located nitrogen in the oversaturated lattice has been found to be the predominant hardness degradation mechanism. The impact of the annealing temperature on a change in surface hardness related to the applied fluence of implanted nitrogen has been demonstrated. |
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| ISSN: | 1996-1944 |