Thermal conductivity of sputtered amorphous Ge films
We measured the thermal conductivity of amorphous Ge films prepared by magnetron sputtering. The thermal conductivity was significantly higher than the value predicted by the minimum thermal conductivity model and increased with deposition temperature. We found that variations in sound velocity and...
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AIP Publishing LLC
2014-02-01
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Series: | AIP Advances |
Online Access: | http://dx.doi.org/10.1063/1.4867122 |
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author | Tianzhuo Zhan Yibin Xu Masahiro Goto Yoshihisa Tanaka Ryozo Kato Michiko Sasaki Yutaka Kagawa |
author_facet | Tianzhuo Zhan Yibin Xu Masahiro Goto Yoshihisa Tanaka Ryozo Kato Michiko Sasaki Yutaka Kagawa |
author_sort | Tianzhuo Zhan |
collection | DOAJ |
description | We measured the thermal conductivity of amorphous Ge films prepared by magnetron sputtering. The thermal conductivity was significantly higher than the value predicted by the minimum thermal conductivity model and increased with deposition temperature. We found that variations in sound velocity and Ge film density were not the main factors in the high thermal conductivity. Fast Fourier transform patterns of transmission electron micrographs revealed that short-range order in the Ge films was responsible for their high thermal conductivity. The results provide experimental evidences to understand the underlying nature of the variation of phonon mean free path in amorphous solids. |
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format | Article |
id | doaj.art-50add3161be54247887b5e281da924d8 |
institution | Directory Open Access Journal |
issn | 2158-3226 |
language | English |
last_indexed | 2024-12-11T08:25:20Z |
publishDate | 2014-02-01 |
publisher | AIP Publishing LLC |
record_format | Article |
series | AIP Advances |
spelling | doaj.art-50add3161be54247887b5e281da924d82022-12-22T01:14:34ZengAIP Publishing LLCAIP Advances2158-32262014-02-0142027126027126-710.1063/1.4867122028402ADVThermal conductivity of sputtered amorphous Ge filmsTianzhuo Zhan0Yibin Xu1Masahiro Goto2Yoshihisa Tanaka3Ryozo Kato4Michiko Sasaki5Yutaka Kagawa6National Institute for Materials Science, 1-2-1 Sengen, Tsukuba 305-0047, JapanNational Institute for Materials Science, 1-2-1 Sengen, Tsukuba 305-0047, JapanNational Institute for Materials Science, 1-2-1 Sengen, Tsukuba 305-0047, JapanNational Institute for Materials Science, 1-2-1 Sengen, Tsukuba 305-0047, JapanNational Institute for Materials Science, 1-2-1 Sengen, Tsukuba 305-0047, JapanNational Institute for Materials Science, 1-2-1 Sengen, Tsukuba 305-0047, JapanNational Institute for Materials Science, 1-2-1 Sengen, Tsukuba 305-0047, JapanWe measured the thermal conductivity of amorphous Ge films prepared by magnetron sputtering. The thermal conductivity was significantly higher than the value predicted by the minimum thermal conductivity model and increased with deposition temperature. We found that variations in sound velocity and Ge film density were not the main factors in the high thermal conductivity. Fast Fourier transform patterns of transmission electron micrographs revealed that short-range order in the Ge films was responsible for their high thermal conductivity. The results provide experimental evidences to understand the underlying nature of the variation of phonon mean free path in amorphous solids.http://dx.doi.org/10.1063/1.4867122 |
spellingShingle | Tianzhuo Zhan Yibin Xu Masahiro Goto Yoshihisa Tanaka Ryozo Kato Michiko Sasaki Yutaka Kagawa Thermal conductivity of sputtered amorphous Ge films AIP Advances |
title | Thermal conductivity of sputtered amorphous Ge films |
title_full | Thermal conductivity of sputtered amorphous Ge films |
title_fullStr | Thermal conductivity of sputtered amorphous Ge films |
title_full_unstemmed | Thermal conductivity of sputtered amorphous Ge films |
title_short | Thermal conductivity of sputtered amorphous Ge films |
title_sort | thermal conductivity of sputtered amorphous ge films |
url | http://dx.doi.org/10.1063/1.4867122 |
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